SCHEMBL3055210

SCHEMBL3055210

C=CC(=O)CNC(=O)C=C

nearest known ligand 0.59

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.59
ALDH1A1 P00352 4/20 0.59
MAPK1 P28482 1/20 0.59
TDP1 Q9NUW8 1/20 0.59
ZDHHC20 Q5W0Z9 1/20 0.43
ZDHHC2 Q9UIJ5 1/20 0.43
TGM2 P21980 9/20 0.39
PSMB5 P28074 1/20 0.32
LMNA P02545 2/20 0.32
GAA P10253 1/20 0.31
FGFR4 P22455 1/20 0.30
F13A1 P00488 1/20 0.30
TGM1 P22735 1/20 0.30
TGM3 Q08188 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25806 0.83
SCHEMBL1488043 0.83 TSHR (0.65) TSHRALDH1A1MAPK1TDP1ZDHHC20
SCHEMBL22171782 0.81 TSHR (0.62) TSHRALDH1A1MAPK1TDP1ZDHHC20
Ammonia Solution, Strong SCHEMBL27963019 0.81
Formaldehyde SCHEMBL8466228 0.81
Methane SCHEMBL27684800 0.81
Water SCHEMBL9482345 0.81
Ethylene SCHEMBL10406317 0.81
SCHEMBL28956758 0.81
SCHEMBL19371288 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1199603-B1 Positive photosensitive composition FUJIFILM CORP (JP) 2016-11-30 EP disclosed
US-8299191-B2 Shape memory polymers and process for preparing GEORGIA TECH RESEARCH CORP. (US) 2012-10-30 US disclosed
US-20110092652-A1 SHAPE MEMORY POLYMERS AND PROCESS FOR PREPARING GEORGIA TECH RESEARCH CORPORATION 2011-04-21 US disclosed
US-7812194-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2010-10-12 US disclosed
US-20100255419-A1 POSITIVE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2010-10-07 US disclosed
US-7776512-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2010-08-17 US disclosed
US-20090148791-A1 POSITIVE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2009-06-11 US disclosed
US-7435526-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2008-10-14 US disclosed
US-20070003871-A1 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. 2007-01-04 US disclosed
US-20050130060-A1 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. 2005-06-16 US disclosed
EP-0907107-B1 Package of photosensitive planographic printing plates FUJI PHOTO FILM CO LTD (JP) 2003-04-02 EP disclosed
US-6534234-B1 Superposing a photosensitive planographic printing plate and a protection paper alternately to protect the surface of the photosensitive layer from abrasion FUJI PHOTO FILM CO., LTD. (JP) 2003-03-18 US disclosed
US-20020102491-A1 Comprising iodinium or sulfonium salt capable of generating a specified sulfonic acid upon irradiation and an acid decomposable resin (such as polyhydroxystyrene) FUJI PHOTO FILM CO., LTD. 2002-08-01 US disclosed
EP-1199603-A9 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2002-07-31 EP disclosed
EP-0716347-B1 Developer for photosensitive lithographic printing plate FUJI PHOTO FILM CO LTD (JP) 2002-07-24 EP disclosed
EP-1199603-A1 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2002-04-24 EP disclosed
US-6030748-A PHOTOSENSITIVE LAYER OF A HYDROLYZED AND POLYCONDENSED POLYMER OF ORGANOSILICONE OR ORGANOMETALLIC COMPOUND MONOMER IN A SOLVENT HAVING DISSOLVED THEREIN A PHENOL COMPOUND OR AN ORGANIC PHOSPHORIC ACID FUJI PHOTO FILM CO., LTD. (JP) 2000-02-29 US disclosed
EP-0907107-A2 Package of photosensitive planographic printing plates and photosensitive planographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 1999-04-07 EP disclosed
US-5837425-A PRESENSITIZATION OF PLATES, SUPPORTS, MULTILAYER, EXPOSURE TO ACTINIC RADIATION OF FILMS, DEVELOPMENT OF PLATES WITH ALKALI FUJI PHOTO FILM CO., LTD. (JP) 1998-11-17 US disclosed
EP-0716347-A1 Developer for photosensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 1996-06-12 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100255419-A1 POSITIVE PHOTOSENSITIVE COMPOSITION RARA, SUN2, RARG TSHR 4674/4885ALDH1A1 2704/4885MAPK1 4102/4885
US-20020102491-A1 Comprising iodinium or sulfonium salt capable of generating a specified sulfonic acid upon irradiation and an acid decomposable resin (such as polyhydroxystyrene) RARA, ARSA, RARB TSHR 1582/4885ALDH1A1 2278/4885MAPK1 2078/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.