SCHEMBL3057650

SCHEMBL3057650

C=Cc1ccc(-c2ccc(Br)s2)s1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SNCA P37840 1/20 0.37
MAPT P10636 5/20 0.36
MEN1 O00255 4/20 0.36
KMT2A Q03164 4/20 0.36
ALOX12 P18054 3/20 0.36
HSD17B10 Q99714 2/20 0.36
ALOX15 P16050 1/20 0.36
RAB9A P51151 3/20 0.36
SMN1; SMN2 Q16637 3/20 0.36
NPC1 O15118 2/20 0.36
NFKB1 P19838 1/20 0.36
NFKB2 Q00653 1/20 0.36
RELA Q04206 1/20 0.36
ALPL P05186 1/20 0.36
HSP90AA1 P07900 1/20 0.36
ALPI P09923 1/20 0.36
ALPG P10696 1/20 0.36
G6PD P11413 1/20 0.36
POLB P06746 4/20 0.35
KDM4E B2RXH2 3/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29493701 0.86 DPP4 (0.39) MAPTMEN1KMT2AALOX12HSD17B10
SCHEMBL14552134 0.84 DPP4 (0.42) MAPTMEN1KMT2AALOX12HSD17B10
SCHEMBL50198 0.78 DPP4 (0.53) SNCAMAPTMEN1KMT2AALOX12
SCHEMBL197157 0.78 SNCA (0.50) SNCAMAPTMEN1KMT2AALOX12
SCHEMBL29097726 0.77 DPP4 (0.52) SNCAMAPTMEN1KMT2AALOX12
SCHEMBL50461 0.77 DPP4 (0.56) SNCAMAPTMEN1KMT2AALOX12
SCHEMBL14037046 0.74 MAPT (0.43) MAPTMEN1KMT2AHSD17B10RAB9A
SCHEMBL5389147 0.72
SCHEMBL15105764 0.70 MEN1 (0.39) SNCAMAPTMEN1KMT2AALOX12
SCHEMBL975461 0.69 DPP4 (0.68) MAPTMEN1KMT2AALOX12HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100221646-A1 HOLOGRAPHIC RECORDING MEDIUM KABUSHIKI KAISHA TOSHIBA (JP) 2010-09-02 US claimed
US-9171961-B2 Coating materials for oxide thin film transistors POLYERA CORPORATION (US) 2015-10-27 US disclosed
US-9171961-B2 Coating materials for oxide thin film transistors POLYERA CORPORATION (US) 2015-10-27 US disclosed
US-20140021465-A1 Coating Materials for Oxide Thin Film Transistors FLEXTERRA, INC. 2014-01-23 US disclosed
US-20140021465-A1 Coating Materials for Oxide Thin Film Transistors FLEXTERRA, INC. 2014-01-23 US disclosed
WO-2014011935-A1 COATING MATERIALS FOR OXIDE THIN FILM TRANSISTORS POLYERA CORPORATION (US) 2014-01-16 WO disclosed
US-20100221646-A1 HOLOGRAPHIC RECORDING MEDIUM KABUSHIKI KAISHA TOSHIBA (JP) 2010-09-02 US disclosed