Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.72 |
| ▸ | EGFR | P00533 | 2/20 | 0.72 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.72 |
| ▸ | CISD1 | Q9NZ45 | 1/20 | 0.72 |
| ▸ | SLC16A3 | O15427 | 1/20 | 0.72 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.72 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.72 |
| ▸ | HPGD | P15428 | 1/20 | 0.72 |
| ▸ | SLC16A1 | P53985 | 1/20 | 0.72 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.72 |
| ▸ | PLIN1 | O60240 | 1/20 | 0.58 |
| ▸ | LMNA | P02545 | 1/20 | 0.58 |
| ▸ | PLIN5 | Q00G26 | 1/20 | 0.58 |
| ▸ | ABHD5 | Q8WTS1 | 1/20 | 0.58 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL305983 | 1.00 | KDM4E (0.72) | KDM4EEGFRMCL1CISD1SLC16A3 | |
| SCHEMBL3009380 | 1.00 | KDM4E (0.72) | KDM4EEGFRMCL1CISD1SLC16A3 | |
| SCHEMBL4600830 | 0.91 | EGFR (0.85) | KDM4EEGFRCISD1SLC16A3ALDH1A1 | |
| SCHEMBL10413058 | 0.91 | EGFR (0.85) | KDM4EEGFRCISD1SLC16A3ALDH1A1 | |
| SCHEMBL4600832 | 0.91 | EGFR (0.85) | KDM4EEGFRCISD1SLC16A3ALDH1A1 | |
| SCHEMBL3133118 | 0.91 | KDM4E (0.62) | KDM4EEGFRMCL1CISD1SLC16A3 | |
| SCHEMBL8129603 | 0.89 | AKR1C3 (0.70) | KDM4EEGFRMCL1CISD1SLC16A3 | |
| SCHEMBL8129600 | 0.89 | AKR1C3 (0.70) | KDM4EEGFRMCL1CISD1SLC16A3 | |
| SCHEMBL11442127 | 0.89 | EGFR (0.69) | KDM4EEGFRMCL1CISD1SLC16A3 | |
| SCHEMBL11442125 | 0.89 | EGFR (0.69) | KDM4EEGFRMCL1CISD1SLC16A3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1264 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4731727-A1 | HALF-WAVE PLATE | Merck Patent GmbH (DE) | 2026-04-29 | — | — | EP | claimed |
| EP-4713413-A1 | CHIRAL REACTIVE MESOGEN MIXTURE | Merck Patent GmbH (DE) | 2026-03-25 | — | — | EP | claimed |
| EP-4713414-A1 | OPTICAL ELEMENT COMPRISING A CHIRAL LC POLYMER FILM | Merck Patent GmbH (DE) | 2026-03-25 | — | — | EP | claimed |
| WO-2024260930-A1 | HALF-WAVE PLATE | MERCK PATENT GMBH (DE) | 2024-12-26 | — | — | WO | claimed |
| WO-2024235947-A1 | CHIRAL REACTIVE MESOGEN MIXTURE | MERCK PATENT GMBH (DE) | 2024-11-21 | — | — | WO | claimed |
| WO-2024235946-A1 | OPTICAL ELEMENT COMPRISING A CHIRAL LC POLYMER FILM | MERCK PATENT GMBH (DE) | 2024-11-21 | — | — | WO | claimed |
| WO-2024209462-A1 | ANTI-BIOFILM POLYMER COMPOSITIONS | YISSUM RESEARCH DEVELOPMENT COMPANY OF THE HEBREW UNIVERSITY OF JERUSALEM LTD. (IL) | 2024-10-10 | — | — | WO | claimed |
| CN-116217536-A | Synthesis method of jiale musk and catalyst used in synthesis method | 山东新和成药业有限公司 | 2023-06-06 | — | — | CN | claimed |
| CN-116135893-A | Alkali-soluble resin, alkali-soluble resin composition, photo-curing composition and photo-curing product | 常州强力电子新材料股份有限公司 | 2023-05-19 | — | — | CN | claimed |
| CN-114507158-B | Pleuromutilin alpha-cyano cinnamic acid ester compounds with drug-resistant bacteria resisting activity and preparation method and application thereof | 广东医科大学附属医院 | 2023-04-28 | — | — | CN | claimed |
| US-5702820-A | BLEND OF EPOXY RESIN AND UNSATURATED CARBOXYLIC ACID | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 1997-12-30 | — | — | US | claimed |
| EP-0663411-B1 | Photo-imaging resist ink and cured product thereof | NIPPON KAYAKU KK (JP) | 1997-05-28 | — | — | EP | claimed |
| US-5589554-A | BASED ON A 2-CYANOACRYLATE | THREE BOND CO., LTD. (JP) | 1996-12-31 | — | — | US | claimed |
| EP-0663411-A1 | Photo-imaging resist ink and cured product thereof | Nippon Kayaku Kabushiki Kaisha (JP) | 1995-07-19 | — | — | EP | claimed |
| EP-0389427-B1 | Compounds containing both uv-absorber and 1-hydrocarbyloxy hindered amine moieties and stabilized compositions | CIBA GEIGY AG (CH) | 1994-04-27 | — | — | EP | claimed |
| EP-0563251-A1 | UV/EB CURABLE BUTYL COPOLYMERS FOR LITHOGRAPHIC AND CORROSION-RESISTANT COATING APPLICATIONS | EXXON CHEMICAL PATENTS INC. (US) | 1993-10-06 | — | — | EP | claimed |
| EP-0563271-A1 | UV/EB CURABLE BUTYL COPOLYMERS FOR COATING APPLICATIONS | EXXON CHEMICAL PATENTS INC. (US) | 1993-10-06 | — | — | EP | claimed |
| WO-1992011322-A2 | UV/EB CURABLE BUTYL COPOLYMERS FOR LITHOGRAPHIC AND CORROSION-RESISTANT COATING APPLICATIONS | EXXON CHEMICAL PATENTS INC. (US) | 1992-07-09 | — | — | WO | claimed |
| WO-1992011295-A1 | UV/EB CURABLE BUTYL COPOLYMERS FOR COATING APPLICATIONS | EXXON CHEMICAL PATENTS INC. (US) | 1992-07-09 | — | — | WO | claimed |
| US-4255301-A | HEAT RESISTANCE, PHOTOSTABILITY | ARGUS CHEMICAL CORPORATION (US) | 1981-03-10 | — | — | US | claimed |