SCHEMBL306180

SCHEMBL306180

CCO[SiH](CC(N)(CC)CC)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17889228 0.87
SCHEMBL4265648 0.77
SCHEMBL8851707 0.74
SCHEMBL3450815 0.73
SCHEMBL30392477 0.72
SCHEMBL301817 0.72
SCHEMBL158101 0.71
SCHEMBL302687 0.70 TSHR (0.32)
SCHEMBL3655426 0.70 TSHR (0.32)
SCHEMBL28537857 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8252866-B2 Azetidinium-functional polysaccharides and uses thereof GEORGIA-PACIFIC CHEMICALS LLC (US) 2012-08-28 US claimed
US-8011514-B2 Modified amine-aldehyde resins and uses thereof in separation processes GEORGIA-PACIFIC CHEMICALS LLC (US) 2011-09-06 US claimed
EP-2173491-A1 MODIFIED AMINE-ALDEHYDE RESINS AND USES THEREOF IN SEPARATION PROCESSES Georgia-Pacific Chemicals LLC (US) 2010-04-14 EP claimed
EP-2040847-A2 MODIFIED AMINE-ALDEHYDE RESINS AND USES THEREOF IN SEPARATION PROCESSES Georgia-Pacific Chemicals LLC (US) 2009-04-01 EP claimed
WO-2009005977-A1 MODIFIED AMINE-ALDEHYDE RESINS AND USES THEREOF IN SEPARATION PROCESSES GEORGIA-PACIFIC CHEMICALS LLC (US) 2009-01-08 WO claimed
US-20080017552-A1 Modified amine-aldehyde resins and uses thereof in separation processes GEORGIA-PACIFIC CHEMICALS LLC (US) 2008-01-24 US claimed
WO-2007149587-A2 MODIFIED AMINE-ALDEHYDE RESINS AND USES THEREOF IN SEPARATION PROCESSES GEORGIA-PACIFIC CHEMICALS LLC (US) 2007-12-27 WO claimed
WO-2007117880-A1 COMPOSITION FOR ETCHING A METAL HARD MASK MATERIAL IN SEMICONDUCTOR PROCESSING INTEL CORPORATION (US) 2007-10-18 WO claimed
US-20070235684-A1 Composition for etching a metal hard mask material in semiconductor processing INTEL CORPORATION 2007-10-11 US claimed
US-20060246239-A1 Porous inkjet recording material HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 2006-11-02 US claimed
US-10428186-B2 Multi-component particles comprising inorganic nanoparticles distributed in an organic matrix and processes for making and using same SICPA HOLDING SA (CH) 2019-10-01 US disclosed
US-20190105804-A1 GAS DISPERSION MANUFACTURE OF NANOPARTICULATES, AND NANOPARTICULATE-CONTAINING PRODUCTS AND PROCESSING THEREOF SICPA HOLDING SA (CH) 2019-04-11 US disclosed
US-10201916-B2 Gas dispersion manufacture of nanoparticulates, and nanoparticulate-containing products and processing thereof SICPA HOLDING SA (CH) 2019-02-12 US disclosed
US-9567655-B2 Processes for the separation of ores GEORGIA-PACIFIC CHEMICALS LLC (US) 2017-02-14 US disclosed
US-9472456-B2 Technology for selectively etching titanium and titanium nitride in the presence of other materials INTEL CORPORATION (US) 2016-10-18 US disclosed
US-20040115239-A1 implant with functional layer comprises particles having a structure substituted with a functional group, wherein the functional group is adapted to modify a property of the device making it more biocompatible CHILDREN'S HOSPITAL OF PHILADELPHIA, THE 2004-06-17 US disclosed
WO-2004048603-A2 COATINGS UNIVERSITY OF WARWICK (GB) 2004-06-10 WO disclosed
WO-2004027385-A2 ENGINEERING OF MATERIAL SURFACES THE CHILDREN'S HOSPITAL OF PHILADELPHIA (US) 2004-04-01 WO disclosed
WO-2003078527-A1 ADDITION CURABLE SILICONE GUM HAVING IMPROVED THERMAL CONDUCTIVITY DOW CORNING CORPORATION (US) 2003-09-25 WO disclosed
US-20030171487-A1 Heat absorber for computer cores TYCO ELECTRONICS CORPORATION 2003-09-11 US disclosed