⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16813492 | 0.84 | SLC2A1 (0.32) | — | |
| SCHEMBL16813528 | 0.80 | — | — | |
| SCHEMBL1853749 | 0.79 | — | — | |
| SCHEMBL5599048 | 0.77 | CA12 (0.30) | — | |
| SCHEMBL155946 | 0.76 | — | — | |
| SCHEMBL379570 | 0.76 | — | — | |
| SCHEMBL379739 | 0.76 | — | — | |
| SCHEMBL158102 | 0.75 | MEN1 (0.30) | — | |
| SCHEMBL16813927 | 0.75 | KDM5A (0.30) | — | |
| SCHEMBL16813970 | 0.73 | DNM1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 226 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119931027-A | Method for preparing zinc oxide/nylon 6 slice by in-situ polymerization | 浙江恒逸石化研究院有限公司 | 2025-05-06 | — | — | CN | claimed |
| EP-3340253-A1 | UV-RESISTANT ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | claimed |
| EP-3340252-A1 | ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | claimed |
| US-9758689-B2 | Silver nanoparticle inks comprising aminomethylsilanes | XEROX CORPORATION (US) | 2017-09-12 | — | — | US | claimed |
| US-9725639-B2 | Wellbore servicing materials and methods of making and using same | HALLIBURTON ENERGY SERVICES, INC. (US) | 2017-08-08 | — | — | US | claimed |
| US-9441152-B2 | Wellbore servicing compositions and methods of making and using same | HALLIBURTON ENERGY SERVICES, INC. (US) | 2016-09-13 | — | — | US | claimed |
| CN-105713165-A | Polyurethane foam heat-insulation material used for door and window profiles and production process thereof | 南京理工大学常熟研究院有限公司 | 2016-06-29 | — | — | CN | claimed |
| US-20160137907-A1 | WELLBORE SERVICING MATERIALS AND METHODS OF MAKING AND USING SAME | HALLIBURTON ENERGY SERVICES, INC. | 2016-05-19 | — | — | US | claimed |
| US-9206345-B2 | Wellbore servicing compositions and methods of making and using same | HALLIBURTON ENERGY SERVICES, INC. (US) | 2015-12-08 | — | — | US | claimed |
| WO-2014197269-A1 | METHODS OF USING AQUEOUS WELLBORE SERVICING COMPOSITIONS COMPRISING A RESIN AND AN ORGANOSILANE | HALLIBURTON ENERGY SERVICES, INC. (US) | 2014-12-11 | — | — | WO | claimed |
| EP-2173491-A1 | MODIFIED AMINE-ALDEHYDE RESINS AND USES THEREOF IN SEPARATION PROCESSES | Georgia-Pacific Chemicals LLC (US) | 2010-04-14 | — | — | EP | claimed |
| CN-101484246-A | Modified amine-aldehyde resins and their use in separation processes | GEORGIA PACIFIC CHEMICALS LLC (US) | 2009-07-15 | — | — | CN | claimed |
| CN-101410481-A | Composition for etching a metal hard mask material in semiconductor processing | INTEL CORP (US) | 2009-04-15 | — | — | CN | claimed |
| EP-2040847-A2 | MODIFIED AMINE-ALDEHYDE RESINS AND USES THEREOF IN SEPARATION PROCESSES | Georgia-Pacific Chemicals LLC (US) | 2009-04-01 | — | — | EP | claimed |
| WO-2009005977-A1 | MODIFIED AMINE-ALDEHYDE RESINS AND USES THEREOF IN SEPARATION PROCESSES | GEORGIA-PACIFIC CHEMICALS LLC (US) | 2009-01-08 | — | — | WO | claimed |
| US-20080017552-A1 | Modified amine-aldehyde resins and uses thereof in separation processes | GEORGIA-PACIFIC CHEMICALS LLC (US) | 2008-01-24 | — | — | US | claimed |
| WO-2007149587-A2 | MODIFIED AMINE-ALDEHYDE RESINS AND USES THEREOF IN SEPARATION PROCESSES | GEORGIA-PACIFIC CHEMICALS LLC (US) | 2007-12-27 | — | — | WO | claimed |
| WO-2007117880-A1 | COMPOSITION FOR ETCHING A METAL HARD MASK MATERIAL IN SEMICONDUCTOR PROCESSING | INTEL CORPORATION (US) | 2007-10-18 | — | — | WO | claimed |
| US-20070235684-A1 | Composition for etching a metal hard mask material in semiconductor processing | INTEL CORPORATION | 2007-10-11 | — | — | US | claimed |
| US-20060246239-A1 | Porous inkjet recording material | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. | 2006-11-02 | — | — | US | claimed |