⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL21638775 | 0.92 | LMNA (0.53) | — | |
| Acrylic Acid SCHEMBL28139319 | 0.88 | — | — | |
| Acrylic Acid SCHEMBL27548291 | 0.87 | LMNA (0.48) | — | |
| Acrylic Acid SCHEMBL30431258 | 0.87 | LMNA (0.71) | — | |
| Acrylic Acid SCHEMBL614673 | 0.87 | — | — | |
| Acrylic Acid SCHEMBL27615806 | 0.87 | LMNA (0.71) | — | |
| Acrylic Acid SCHEMBL1147986 | 0.87 | — | — | |
| Acrylic Acid SCHEMBL6557843 | 0.87 | LMNA (0.71) | — | |
| Acrylic Acid SCHEMBL29502206 | 0.87 | LMNA (0.71) | — | |
| Acrylic Acid SCHEMBL8059326 | 0.84 | LMNA (0.67) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113788958-A | Sulfophosphoric acid radical-containing divinyl organic silicon modified acrylic acid aqueous dispersion and preparation method and application thereof | 清远市浩宇化工科技有限公司 | 2021-12-14 | — | — | CN | claimed |
| CN-105417903-B | Oil-based rock debris advanced treatment method | 北京矿冶研究总院 | 2018-08-14 | — | — | CN | claimed |
| US-9323151-B2 | Photosensitive oligomer for photosensitive resist, method for preparing the same, and negative photosensitive resist resin composition | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2016-04-26 | — | — | US | claimed |
| US-20150153645-A1 | PHOTOSENSITIVE OLIGOMER FOR PHOTOSENSITIVE RESIST, METHOD FOR PREPARING THE SAME, AND NEGATIVE PHOTOSENSITIVE RESIST RESIN COMPOSITION | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2015-06-04 | — | — | US | claimed |
| CN-119114216-B | Pulping process of high-heat-conductivity silicon nitride slurry | 江苏富乐华功率半导体研究院有限公司 | 2025-03-25 | — | — | CN | disclosed |
| CN-119114216-A | Pulping process of high-heat-conductivity silicon nitride slurry | 江苏富乐华功率半导体研究院有限公司 | 2024-12-13 | — | — | CN | disclosed |
| CN-112795113-B | PVC alloy material and preparation method and application thereof | 金发科技股份有限公司 | 2022-05-20 | — | — | CN | disclosed |
| US-11287378-B2 | Method for assaying cationic polymers by time-resolved photoluminescence | SPCM SA (FR) | 2022-03-29 | — | — | US | disclosed |
| CN-113788958-A | Sulfophosphoric acid radical-containing divinyl organic silicon modified acrylic acid aqueous dispersion and preparation method and application thereof | 清远市浩宇化工科技有限公司 | 2021-12-14 | — | — | CN | disclosed |
| CN-112795113-A | PVC alloy material and preparation method and application thereof | 金发科技股份有限公司 | 2021-05-14 | — | — | CN | disclosed |
| CN-110693983-A | Subcutaneous implantation line for treating epilepsy | 张鹏 | 2020-01-17 | — | — | CN | disclosed |
| CN-105417903-B | Oil-based rock debris advanced treatment method | 北京矿冶研究总院 | 2018-08-14 | — | — | CN | disclosed |
| US-20060046043-A1 | Surface treating material and surface treating process | FUJI PHOTO FILM CO., LTD. (JP) | 2006-03-02 | — | — | US | disclosed |
| CN-1219824-C | Aromatic polycarbonate resin composition and molded article | IDEMITSU PETROCHEMICAL CO (JP) | 2005-09-21 | — | — | CN | disclosed |
| US-20050158088-A1 | Method of fixing toner on recording medium | RICOH COMPANY, LIMITED (JP) | 2005-07-21 | — | — | US | disclosed |
| CN-1449429-A | Aromatic polycarbonate resin composition and moldings | IDEMITSU PETROCHEMICAL CO (JP) | 2003-10-15 | — | — | CN | disclosed |
| CN-1078896-C | Composite particles comprising organic polymer and oxide and/or hydroxide | RHODIA CHIMIE SA (FR) | 2002-02-06 | — | — | CN | disclosed |
| CN-1216052-A | Composite particles including organic polymer and oxide and/or hydroxide | RHODIA CHIMIE SA (FR) | 1999-05-05 | — | — | CN | disclosed |
| CN-1040801-C | Toner for developing electrostatic image, image forming method and apparatus | CANON KK (JP) | 1998-11-18 | — | — | CN | disclosed |
| CN-1051986-A | The colorant, image forming method and the image forming apparatus that are used for developing electrostatic images | CANON KK (JP) | 1991-06-05 | — | — | CN | disclosed |