SCHEMBL3063779

SCHEMBL3063779

OC(C1CC2C=CC1C2)C(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.30
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5892587 0.83
SCHEMBL3364098 0.83 KDM4E (0.32) KDM4ELMNA
SCHEMBL2351424 0.83
SCHEMBL14639864 0.83
SCHEMBL5892544 0.77
SCHEMBL5892530 0.77
SCHEMBL5892490 0.77
SCHEMBL10049061 0.75
SCHEMBL5892469 0.75 KDM4E (0.34) KDM4ELMNA
SCHEMBL5892547 0.73 KDM4E (0.31) KDM4ELMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100266958-A1 RESIST MATERIAL AND METHOD FOR FORMING PATTERN USING THE SAME PANASONIC CORPORATION (JP) 2010-10-21 US claimed
US-20100266958-A1 RESIST MATERIAL AND METHOD FOR FORMING PATTERN USING THE SAME PANASONIC CORPORATION (JP) 2010-10-21 US disclosed