SCHEMBL3364098

SCHEMBL3364098

OC(C1CC2C=CC1C2)C(F)(F)F

nearest known ligand 0.32

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.32
LMNA P02545 1/20 0.32
ALDH1A1 P00352 1/20 0.32
GAA P10253 1/20 0.32
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5892544 0.85
SCHEMBL3063779 0.83 KDM4E (0.30) KDM4ELMNA
SCHEMBL14639864 0.80
SCHEMBL2351424 0.80
SCHEMBL5892469 0.79 KDM4E (0.34) KDM4ELMNA
SCHEMBL5892491 0.79
SCHEMBL5892587 0.78
SCHEMBL3874892 0.77 KDM4E (0.35) KDM4ELMNAALDH1A1GAATDP1
SCHEMBL4608572 0.76 KDM4E (0.38) KDM4ELMNAALDH1A1GAATDP1
SCHEMBL5892490 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1164434-B1 Radiation-sensitive resin composition JSR CORP (JP) 2010-10-06 EP disclosed
US-7390608-B2 Photoresists containing Si-polymers ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2008-06-24 US disclosed
US-7390608-B2 Photoresists containing Si-polymers ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2008-06-24 US disclosed
US-7390608-B2 Photoresists containing Si-polymers ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2008-06-24 US disclosed
US-7306892-B2 Multilayer photoresist system SHIPLEY COMPANY, L.L.C. (US) 2007-12-11 US disclosed
US-7306892-B2 Multilayer photoresist system SHIPLEY COMPANY, L.L.C. (US) 2007-12-11 US disclosed
US-7306892-B2 Multilayer photoresist system SHIPLEY COMPANY, L.L.C. (US) 2007-12-11 US disclosed
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
US-7189490-B2 Photoresists containing sulfonamide component SHIPLEY COMPANY, L.L.C. (US) 2007-03-13 US disclosed
US-7189490-B2 Photoresists containing sulfonamide component SHIPLEY COMPANY, L.L.C. (US) 2007-03-13 US disclosed
US-20040161698-A1 Photoresists containing sulfonamide component SHIPLEY COMPANY L.L.C. 2004-08-19 US disclosed
EP-1422565-A2 Multilayer photoresist systems Shipley Company LLC (US) 2004-05-26 EP disclosed
WO-2004037866-A2 PHOTORESISTS CONTAINING SULFONAMIDE COMPONENT SHIPLEY COMPANY L.L.C. (US) 2004-05-06 WO disclosed
US-6623907-B2 Chemical amplified photoresist JSR CORPORATION (JP) 2003-09-23 US disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed
US-20020009668-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-24 US disclosed
EP-1164434-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-19 EP disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed