Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.51 |
| ▸ | POLB | P06746 | 1/20 | 0.44 |
| ▸ | APEX1 | P27695 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | THRB | P10828 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | NAAA | Q02083 | 2/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
| ▸ | S1PR5 | Q9H228 | 1/20 | 0.31 |
| ▸ | PLG | P00747 | 1/20 | 0.31 |
| ▸ | PLAT | P00750 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21868825 | 0.96 | TSHR (0.48) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL21868826 | 0.94 | TSHR (0.45) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL19792617 | 0.90 | THRB (0.49) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL13401005 | 0.89 | TSHR (0.58) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL10534860 | 0.86 | TSHR (0.51) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL17763326 | 0.85 | TSHR (0.54) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL17763327 | 0.85 | TSHR (0.54) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL17763325 | 0.85 | TSHR (0.54) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL17763324 | 0.85 | TSHR (0.54) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL22726277 | 0.84 | TSHR (0.53) | TSHRPOLBAPEX1HTTTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117215151-A | Preparation method and application of negative high refractive index OC photoresist and photo-curing pattern with good hydrophilic performance | 西安思摩威新材料有限公司 | 2023-12-12 | — | — | CN | claimed |
| CN-117215151-A | Preparation method and application of negative high refractive index OC photoresist and photo-curing pattern with good hydrophilic performance | 西安思摩威新材料有限公司 | 2023-12-12 | — | — | CN | disclosed |