Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 4/20 | 0.43 |
| ▸ | CA9 | Q16790 | 4/20 | 0.43 |
| ▸ | CA2 | P00918 | 3/20 | 0.43 |
| ▸ | HTR1A | P08908 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 4/20 | 0.40 |
| ▸ | DRD2 | P14416 | 4/20 | 0.39 |
| ▸ | DRD3 | P35462 | 4/20 | 0.39 |
| ▸ | DRD1 | P21728 | 2/20 | 0.39 |
| ▸ | DRD4 | P21917 | 2/20 | 0.39 |
| ▸ | DRD5 | P21918 | 2/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.39 |
| ▸ | ADRA1D | P25100 | 1/20 | 0.39 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.39 |
| ▸ | ADRA1B | P35368 | 1/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methyl Alcohol SCHEMBL11583118 | 0.96 | CA12 (0.41) | CA12CA9CA2HTR1ACA1 | |
| Methyl Alcohol SCHEMBL11567436 | 0.96 | CA12 (0.41) | CA12CA9CA2HTR1ACA1 | |
| Hydrogen Peroxide SCHEMBL139782 | 0.92 | CA12 (0.43) | CA12CA9CA2HTR1ACA1 | |
| Hydrogen Peroxide SCHEMBL139780 | 0.92 | CA12 (0.43) | CA12CA9CA2HTR1ACA1 | |
| SCHEMBL2729745 | 0.91 | HRH3 (0.41) | CA12CA9CA2HTR1ACA1 | |
| SCHEMBL21224483 | 0.91 | HRH3 (0.41) | CA12CA9CA2HTR1ACA1 | |
| SCHEMBL5358 | 0.91 | HRH3 (0.41) | CA12CA9CA2HTR1ACA1 | |
| Alcohol SCHEMBL13280379 | 0.88 | TSHR (0.46) | CA12CA9CA2HTR1ACA1 | |
| Hydrochloric Acid SCHEMBL210163 | 0.87 | HRH3 (0.39) | CA12CA9CA2HTR1ACA1 | |
| SCHEMBL10948053 | 0.87 | HRH3 (0.39) | CA12CA9CA2HTR1ACA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1027415-A1 | CLEANING COMPOSITIONS AND METHODS FOR CLEANING RESIN AND POLYMERIC MATERIALS USED IN MANUFACTURE | Kyzen Corporation (US) | 2000-08-16 | — | — | EP | claimed |
| US-6054061-A | HYDROGEN PEROXIDE, INORGANIC ACID, AN AMINE FREE OF A SURFACTANT GROUP A CORROSION INHIBITOR; TREATING A METAL SURFACE TO INCREASE ITS SURFACE ROUGHNESS FOR SUBSEQUENT ADHESION TO A POLYMER LAYER. | SHIPLEY COMPANY, L.L.C. (US) | 2000-04-25 | — | — | US | claimed |
| WO-1999016855-A1 | CLEANING COMPOSITIONS AND METHODS FOR CLEANING RESIN AND POLYMERIC MATERIALS USED IN MANUFACTURE | KYZEN CORPORATION (US) | 1999-04-08 | — | — | WO | claimed |
| US-8367312-B2 | Detergent for lithography and method of forming resist pattern with the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-02-05 | — | — | US | disclosed |
| US-7897325-B2 | Lithographic rinse solution and method for forming patterned resist layer using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-03-01 | — | — | US | disclosed |
| US-7795197-B2 | Cleaning liquid for lithography and method for resist pattern formation | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-09-14 | — | — | US | disclosed |
| US-20090004608-A1 | Detergent For Lithography And Method Of Forming Resist Pattern With The Same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-01-01 | — | — | US | disclosed |
| US-20080096141-A1 | Cleaning Liquid For Lithography And Method For Resist Pattern Formation | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-04-24 | — | — | US | disclosed |
| EP-1832931-A1 | CLEANING LIQUID FOR LITHOGRAPHY AND METHOD FOR RESIST PATTERN FORMATION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-09-12 | — | — | EP | disclosed |
| US-20060128581-A1 | Lithographic rinse solution and method for forming patterned resist layer using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-06-15 | — | — | US | disclosed |
| EP-1027415-A1 | CLEANING COMPOSITIONS AND METHODS FOR CLEANING RESIN AND POLYMERIC MATERIALS USED IN MANUFACTURE | Kyzen Corporation (US) | 2000-08-16 | — | — | EP | disclosed |
| US-6060439-A | TETRAHYDROFURFURYL ALCOHOL AND TETRAMETHYLAMMONIUM HYDROXIDE; OPTICAL LENSES | KYZEN CORPORATION (US) | 2000-05-09 | — | — | US | disclosed |
| US-6017862-A | FOR CLEANING, SOLVATING AND/OR REMOVING PLASTIC RESINS AND POLYMERS FROM MANUFACTURED ARTICLES OR MANUFACTURING EQUIPMENT, SUCH AS IN THE PRODUCTION OF OPTICAL LENSES | KYZEN CORPORATION (US) | 2000-01-25 | — | — | US | disclosed |
| US-5962383-A | USING MIXTURE CONTAINING TETRAHYDROFURFURYL ALCOHOL AND TETRAMETHYLAMMONIUM HYDROXIDE AND WATER | KYZEN CORPORATION (US) | 1999-10-05 | — | — | US | disclosed |
| WO-1999016855-A1 | CLEANING COMPOSITIONS AND METHODS FOR CLEANING RESIN AND POLYMERIC MATERIALS USED IN MANUFACTURE | KYZEN CORPORATION (US) | 1999-04-08 | — | — | WO | disclosed |
| US-3981828-A | ISOCYANATE TRIMERIZATION CATALYSTS | BASF WYANDOTTE CORPORATION (US) | 1976-09-21 | — | — | US | disclosed |