SCHEMBL30694

SCHEMBL30694

CC1OCC2(CO1)COC(C)OC2

nearest known ligand 0.42

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.36
CYP2C19 P33261 1/20 0.36
KMT2A Q03164 1/20 0.36
CHRM1 P11229 2/20 0.33
CHRM2 P08172 1/20 0.33
LMNA P02545 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10265810 0.90
SCHEMBL21375258 0.85 MEN1 (0.30) MEN1CYP2C19KMT2A
SCHEMBL14870474 0.85 MEN1 (0.30) MEN1CYP2C19KMT2A
SCHEMBL14006366 0.83
SCHEMBL30720 0.81 KDM4E (0.33) MEN1CYP2C19KMT2ACHRM1CHRM2
SCHEMBL16596132 0.81
SCHEMBL1937905 0.79
SCHEMBL15185012 0.77
SCHEMBL13358782 0.76
SCHEMBL44379 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 109 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8007938-B2 Nonaqueous electrolyte solution and lithium secondary battery using same MITSUBISHI CHEMICAL CORPORATION (JP) 2011-08-30 US claimed
US-20230340177-A1 COMPOSITION AND SILOXANE-BASED THERMOPLASTIC RESIN USING SAME, AND METHODS FOR PRODUCING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-10-26 US disclosed
US-20230340177-A1 COMPOSITION AND SILOXANE-BASED THERMOPLASTIC RESIN USING SAME, AND METHODS FOR PRODUCING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-10-26 US disclosed
WO-2023171578-A1 THERMOPLASTIC RESIN, METHOD FOR PRODUCING SAME, THERMOPLASTIC RESIN COMPOSITION AND MOLDED BODY 三菱瓦斯化学株式会社 2023-09-14 WO disclosed
EP-4219593-A1 COMPOSITION AND SILOXANE-BASED THERMOPLASTIC RESIN USING SAME, AND METHODS FOR PRODUCING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-08-02 EP disclosed
EP-4065486-A1 PACKAGING COATING SYSTEM SWIMC LLC (US) 2022-10-05 EP disclosed
WO-2022128170-A1 THERMOPLASTIC MOLDING COMPOUND HAVING GOOD MECHANICAL PROPERTIES COVESTRO DEUTSCHLAND AG (DE) 2022-06-23 WO disclosed
WO-2022128172-A1 THERMOPLASTIC MOLDING COMPOSITION HAVING GOOD MECHANICAL PROPERTIES COVESTRO DEUTSCHLAND AG (DE) 2022-06-23 WO disclosed
EP-4015549-A1 THERMOPLASTIC COMPOSITIONS WITH GOOD MECHANICAL PROPERTIES Covestro Deutschland AG (DE) 2022-06-22 EP disclosed
EP-4015551-A1 THERMOPLASTIC COMPOSITIONS WITH GOOD MECHANICAL PROPERTIES Covestro Deutschland AG (DE) 2022-06-22 EP disclosed
US-20090246560-A1 MAGNETIC RECORDING MEDIUM, METHOD OF MODIFYING SURFACE OF MAGNETIC POWDER AND MAGNETIC COATING MATERIAL FUJIFILM CORPORATION (JP) 2009-10-01 US disclosed
US-20090087687-A1 SULFONIC ACID POLYOL COMPOUND, POLYURETHANE RESIN, POLYURETHANE RESIN FOR MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-20090087687-A1 SULFONIC ACID POLYOL COMPOUND, POLYURETHANE RESIN, POLYURETHANE RESIN FOR MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
WO-2009034023-A2 FLAME RETARDANT COMBINATIONS OF HYDROXYALKYL PHOSPHINE OXIDES WITH 1,3,5-TRIAZINES AND EPOXIDES BASF SE (CH) 2009-03-19 WO disclosed
US-20090069198-A1 Biomolecular Attachment Sites on Microelectronic Arrays and Methods Thereof ADOR DIAGNOSTICS S.R.L. (IT) 2009-03-12 US disclosed
US-7410673-B2 BLEND CURABLE AT A LOW AND HIGH TEMPERATURE OF AN EPOXY RESIN-UNSATURATED ALIPHATIC ACID ADDUCT, A (METH)ACRYLATE, A FREE RADICAL INITIATOR, A CRYSTALLIZABLE EPOXY RESIN, AND LATENT CURING AGENT; SMOOTH UNDERCOATINGS FOR CIRCUIT BOARDS SAN-EI KAGAKU CO., LTD. (JP) 2008-08-12 US disclosed
US-7396885-B2 Photo-setting and thermosetting resin composition, process for preparing plugged-through-hole printed wiring board and plugged-through-hole printed wiring board SAN-EI KAGAKU CO., LTD. (JP) 2008-07-08 US disclosed
EP-1569803-B1 PROTECTIVE CLOTHING, MASK OR TAG CIBA HOLDING INC (CH) 2008-05-14 EP disclosed
US-20070224514-A1 Nonaqueous Electrolyte Solution and Lithium Secondary Battery Using Same MITSUBISHI CHEMICAL CORPORATION (JP) 2007-09-27 US disclosed
EP-1744394-A1 NONAQUEOUS ELECTROLYTE SOLUTION AND LITHIUM SECONDARY BATTERY USING SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2007-01-17 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090087687-A1 SULFONIC ACID POLYOL COMPOUND, POLYURETHANE RESIN, POLYURETHANE RESIN FOR MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM ASH2L, ASIC1, HNRNPL MEN1 1191/4885CYP2C19 3662/4885KMT2A 506/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.