Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Lithium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C9 | P11712 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Lithium Ion SCHEMBL30715856 | 0.82 | — | — | |
| SCHEMBL131389 | 0.79 | ALDH1A1 (0.36) | — | |
| SCHEMBL13464912 | 0.77 | — | — | |
| Lithium Ion SCHEMBL30715888 | 0.77 | CYP2C9 (0.34) | CYP2C9TSHRCYP2C19HIF1AHSD17B10 | |
| SCHEMBL23239809 | 0.76 | — | — | |
| SCHEMBL2708464 | 0.76 | — | — | |
| SCHEMBL18462661 | 0.71 | PLA2G2C (0.32) | CYP2C19 | |
| SCHEMBL128195 | 0.71 | PLA2G2C (0.35) | CYP2C9TSHRCYP2C19HIF1AHSD17B10 | |
| SCHEMBL31142004 | 0.71 | TSHR (0.45) | TSHR | |
| SCHEMBL20055306 | 0.70 | CA1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119234053-A | Material for chemical vapor deposition, film production method and film | 乔治洛德方法研究和开发液化空气有限公司 | 2024-12-31 | — | — | CN | disclosed |
| WO-2023248755-A1 | MATERIAL FOR CHEMICAL VAPOR DEPOSITION, FILM PRODUCTION METHOD, AND FILM | レール・リキード－ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード | 2023-12-28 | — | — | WO | disclosed |