⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Chloroform SCHEMBL10950487 | 0.89 | LMNA (1.00) | — | |
| Chloroform SCHEMBL30536988 | 0.89 | — | — | |
| Chloroform SCHEMBL10949561 | 0.89 | LMNA (1.00) | — | |
| Chloroform SCHEMBL88 | 0.89 | — | — | |
| Chloroform SCHEMBL11043408 | 0.89 | LMNA (1.00) | — | |
| Chloroform SCHEMBL2084455 | 0.89 | — | — | |
| Chloroform SCHEMBL21830375 | 0.80 | — | — | |
| Chloroform SCHEMBL4952047 | 0.80 | — | — | |
| Chloroform SCHEMBL22558199 | 0.80 | — | — | |
| Chloroform SCHEMBL21635672 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118725844-A | Method for preparing high-sphericity high-strength tectorial membrane propping agent by emulsion polymerization method | 凯泽未来(无锡)数字智能科技有限公司 | 2024-10-01 | — | — | CN | claimed |
| CN-116120006-B | Foam concrete composite heat-insulating wall and construction method | 中铁十八局集团北京工程有限公司 | 2023-07-25 | — | — | CN | claimed |
| CN-116120006-A | Foam concrete composite heat-insulating wall and construction method | 中铁十八局集团北京工程有限公司 | 2023-05-16 | — | — | CN | claimed |
| US-4301323-A | Lead-doped silicon with enhanced semiconductor properties | SIEMENS AKTIENGESELLSCHAFT (DE) | 1981-11-17 | — | — | US | claimed |
| US-20250305140-A1 | SiC Growth Substrate, CVD Reactor and Method for the Production of SiC | Zadient Technologies SAS (FR) | 2025-10-02 | — | — | US | disclosed |
| EP-4555133-A1 | METHOD AND DEVICE FOR PRODUCING A SIC SOLID MATERIAL | Zadient Technologies SAS (FR) | 2025-05-21 | — | — | EP | disclosed |
| CN-119774602-A | Silicon-carbon composite material for catalyzing graphitization, preparation method of silicon-carbon composite material and lithium ion battery | 深圳索理德新材料科技有限公司 | 2025-04-08 | — | — | CN | disclosed |
| EP-4526251-A1 | SIC GROWTH SUBSTRATE, CVD REACTOR AND METHOD FOR THE PRODUCTION OF SIC | Zadient Technologies SAS (FR) | 2025-03-26 | — | — | EP | disclosed |
| CN-222605424-U | Light device is removed to trichlorosilane rectifying column | 河南尚宇新能源股份有限公司 | 2025-03-14 | — | — | CN | disclosed |
| CN-119286479-A | Liquid cooling working medium, preparation method thereof and electronic equipment | 超聚变数字技术有限公司 | 2025-01-10 | — | — | CN | disclosed |
| WO-2024013049-A9 | METHOD AND DEVICE FOR PRODUCING A SiC SOLID MATERIAL | Zadient Technologies SAS (FR) | 2025-01-09 | — | — | WO | disclosed |
| CN-118725844-A | Method for preparing high-sphericity high-strength tectorial membrane propping agent by emulsion polymerization method | 凯泽未来(无锡)数字智能科技有限公司 | 2024-10-01 | — | — | CN | disclosed |
| EP-0529189-A2 | Method of making fused silica | Corning Incorporated (US) | 1993-03-03 | — | — | EP | disclosed |
| US-5154744-A | Method of making titania-doped fused silica | CORNING INCORPORATED (US) | 1992-10-13 | — | — | US | disclosed |
| US-5152819-A | Oxidation and flame hydrolysis of a halide-free organosilicon compound | CORNING INCORPORATED (US) | 1992-10-06 | — | — | US | disclosed |
| US-5043002-A | Oxidation, flame hydrolysis; halogen-free; by-product inhibitor | CORNING INCORPORATED (US) | 1991-08-27 | — | — | US | disclosed |
| US-4301323-A | Lead-doped silicon with enhanced semiconductor properties | SIEMENS AKTIENGESELLSCHAFT (DE) | 1981-11-17 | — | — | US | disclosed |
| US-4237471-A | Method of producing a semiconductor photodiode of indium antimonide and device thereof | HAMAMATSU CORPORATION (US) | 1980-12-02 | — | — | US | disclosed |
| US-4151264-A | Process of melting down and purifying silicon | WACKER-CHEMIE GMBH (DE) | 1979-04-24 | — | — | US | disclosed |
| US-3980042-A | Vapor deposition apparatus with computer control | SIEMENS AKTIENGESELLSCHAFT (DT) | 1976-09-14 | — | — | US | disclosed |