⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18796487 | 0.75 | — | — | |
| SCHEMBL22134352 | 0.72 | CYP2D6 (0.47) | — | |
| SCHEMBL2112269 | 0.72 | — | — | |
| SCHEMBL3077789 | 0.72 | — | — | |
| SCHEMBL16643881 | 0.72 | ALDH1A1 (0.33) | — | |
| SCHEMBL4442419 | 0.69 | — | — | |
| SCHEMBL44558 | 0.69 | — | — | |
| SCHEMBL117445 | 0.69 | — | — | |
| SCHEMBL5178444 | 0.69 | — | — | |
| SCHEMBL8963639 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240134273-A1 | SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2024-04-25 | — | — | US | disclosed |
| CN-117850162-A | Semiconductor photoresist composition and method of forming pattern using the same | 三星SDI株式会社 | 2024-04-09 | — | — | CN | disclosed |
| US-7833331-B2 | Non-toxic corrosion-protection pigments based on cobalt | UNIVERSITY OF DAYTON (US) | 2010-11-16 | — | — | US | disclosed |
| US-7789958-B2 | Non-toxic corrosion-protection pigments based on manganese | UNIVERSITY OF DAYTON (US) | 2010-09-07 | — | — | US | disclosed |
| US-20090163628-A1 | NON-TOXIC CORROSION-PROTECTION PIGMENTS BASED ON COBALT | STURGILL JEFFREY ALLEN | 2009-06-25 | — | — | US | disclosed |
| US-7422793-B2 | Non-toxic corrosion-protection rinses and seals based on rare earth elements | UNIVERSITY OF DAYTON (US) | 2008-09-09 | — | — | US | disclosed |
| US-7407711-B2 | Non-toxic corrosion-protection conversion coats based on rare earth elements | UNIVERSITY OF DAYTON (US) | 2008-08-05 | — | — | US | disclosed |
| US-7294211-B2 | Non-toxic corrosion-protection conversion coats based on cobalt | UNIVERSITY OF DAYTON (US) | 2007-11-13 | — | — | US | disclosed |
| US-7291217-B2 | Non-toxic corrosion-protection pigments based on rare earth elements | UNIVERSITY OF DAYTON (US) | 2007-11-06 | — | — | US | disclosed |
| US-20070149673-A1 | NON-TOXIC CORROSION-PROTECTION PIGMENTS BASED ON MANGANESE | STURGILL JEFFREY A | 2007-06-28 | — | — | US | disclosed |
| US-20040020568-A1 | Non-toxic corrosion-protection conversion coats based on rare earth elements | DAYTON, UNIVERSITY OF | 2004-02-05 | — | — | US | disclosed |
| US-20040016910-A1 | Non-toxic corrosion-protection rinses and seals based on rare earth elements | DAYTON, UNIVERSITY OF | 2004-01-29 | — | — | US | disclosed |
| US-20040011252-A1 | Non-toxic corrosion-protection pigments based on manganese | UNIVERSITY OF DAYTON | 2004-01-22 | — | — | US | disclosed |
| US-20030234063-A1 | Non-toxic corrosion-protection conversion coats based on cobalt | DAYTON, UNIVERSITY OF | 2003-12-25 | — | — | US | disclosed |
| US-20030230363-A1 | Non-toxic corrosion-protection rinses and seals based on cobalt | UNIVERSITY OF DAYTON | 2003-12-18 | — | — | US | disclosed |
| WO-2003060192-A1 | NON-TOXIC CORROSION-PROTECTION RINSES AND SEALS BASED ON COBALT | UNIVERSITY OF DAYTON (US) | 2003-07-24 | — | — | WO | disclosed |
| WO-2003060191-A2 | NON-TOXIC CORROSION-PROTECTION CONVERSION COATINGES ABSED ON COBALT | UNIVERSITY OF DAYTON (US) | 2003-07-24 | — | — | WO | disclosed |
| WO-2003060019-A1 | NON-TOXIC CORROSION PROTECTION PIGMENTS BASED ON COBALT | UNIVERSITY OF DAYTON (US) | 2003-07-24 | — | — | WO | disclosed |
| US-6458908-B1 | A PROCESS FOR PREPARING A SULFUR-CONTAINING UNSATURATED CARBOXYLATE COMPOUND AS CLAIMED IN CLAIM 1 COMPRISING REACTING A SULFUR-CONTAINING DERIVATIVE FOR OPTICAL POLYMERS | MITSUI CHEMICALS, INC. (JP) | 2002-10-01 | — | — | US | disclosed |
| EP-1057808-A2 | Sulfur-containing unsaturated carboxylate compound and its use | Mitsui Chemicals, Inc. (JP) | 2000-12-06 | — | — | EP | disclosed |