SCHEMBL30735970

SCHEMBL30735970

O=S(=O)(NS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)F

nearest known ligand 0.59

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
CA2 P00918 20/20 0.59
CA1 P00915 19/20 0.59
MMP1 P03956 4/20 0.59
MMP2 P08253 4/20 0.59
MMP9 P14780 4/20 0.59
MMP8 P22894 4/20 0.59
MMP13 P45452 4/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL107276 0.98 CA2 (0.58) CA2CA1MMP1MMP2MMP9
SCHEMBL2230675 0.95 CA2 (0.56) CA2CA1MMP1MMP2MMP9
SCHEMBL2232614 0.95 CA2 (0.56) CA2CA1MMP1MMP2MMP9
SCHEMBL2234024 0.95 CA2 (0.56) CA2CA1MMP1MMP2MMP9
SCHEMBL7797690 0.93 CA2 (0.67) CA2CA1MMP1MMP2MMP9
SCHEMBL898868 0.93 CA2 (0.67) CA2CA1MMP1MMP2MMP9
SCHEMBL20473121 0.93 CA2 (0.67) CA2CA1MMP1MMP2MMP9
SCHEMBL20473120 0.91 CA2 (0.64) CA2CA1MMP1MMP2MMP9
SCHEMBL3434755 0.91 CA2 (0.60) CA2CA1MMP1MMP2MMP9
SCHEMBL3433952 0.91 CA2 (0.48) CA2CA1MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4546456-A1 SURFACE TREATMENT AGENT FOR ELECTRODE MATERIAL, POSITIVE ELECTRODE ACTIVE MATERIAL, CURRENT COLLECTOR FOIL, NEGATIVE ELECTRODE ACTIVE MATERIAL, CONDUCTIVE AID, ELECTRODE, BATTERY, METHOD FOR MANUFACTURING POSITIVE ELECTRODE ACTIVE MATERIAL, METHOD FOR MANUFACTURING CURRENT COLLECTOR FOIL, METHOD FOR MANUFACTURING NEGATIVE ELECTRODE ACTIVE MATERIAL, METHOD FOR MANUFACTURING CONDUCTIVE AID, AND METHOD FOR MANUFACTURING ELECTRODE DAIKIN INDUSTRIES, LTD. (JP) 2025-04-30 EP disclosed
US-20250132344-A1 SURFACE TREATMENT AGENT FOR ELECTRODE MATERIAL, POSITIVE ELECTRODE ACTIVE MATERIAL, CURRENT COLLECTOR FOIL, NEGATIVE ELECTRODE ACTIVE MATERIAL, CONDUCTIVE AID, ELECTRODE, BATTERY, METHOD FOR MANUFACTURING POSITIVE ELECTRODE ACTIVE MATERIAL, METHOD FOR MANUFACTURING CURRENT COLLECTOR FOIL, METHOD FOR MANUFACTURING NEGATIVE ELECTRODE ACTIVE MATERIAL, METHOD FOR MANUFACTURING CONDUCTIVE AID, AND METHOD FOR MANUFACTURING ELECTRODE DAIKIN INDUSTRIES, LTD. (JP) 2025-04-24 US disclosed
CN-119422259-A Surface treatment agent for electrode material, positive electrode active material, current collecting foil, negative electrode active material, conductive auxiliary agent, electrode, battery, method for producing positive electrode active material, method for producing current collecting foil, method for producing negative electrode active material, method for producing conductive auxiliary agent, and method for producing electrode 大金工业株式会社 2025-02-11 CN disclosed
WO-2023249003-A1 SURFACE TREATMENT AGENT FOR ELECTRODE MATERIAL, POSITIVE ELECTRODE ACTIVE MATERIAL, CURRENT COLLECTOR FOIL, NEGATIVE ELECTRODE ACTIVE MATERIAL, CONDUCTIVE AID, ELECTRODE, BATTERY, METHOD FOR MANUFACTURING POSITIVE ELECTRODE ACTIVE MATERIAL, METHOD FOR MANUFACTURING CURRENT COLLECTOR FOIL, METHOD FOR MANUFACTURING NEGATIVE ELECTRODE ACTIVE MATERIAL, METHOD FOR MANUFACTURING CONDUCTIVE AID, AND METHOD FOR MANUFACTURING ELECTRODE ダイキン工業株式会社 2023-12-28 WO disclosed