⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL1071425 | 0.97 | — | — | |
| SCHEMBL31634766 | 0.97 | — | — | |
| SCHEMBL11369282 | 0.90 | — | — | |
| SCHEMBL7761831 | 0.87 | THRB (0.50) | — | |
| SCHEMBL30514685 | 0.87 | — | — | |
| SCHEMBL412527 | 0.87 | THRB (0.50) | — | |
| SCHEMBL31634768 | 0.74 | — | — | |
| SCHEMBL15167 | 0.69 | — | — | |
| SCHEMBL8600029 | 0.69 | TSHR (0.71) | — | |
| SCHEMBL439119 | 0.69 | TSHR (0.71) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 111 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118978675-A | Anti-blooming low-temperature TGIC cured weather-resistant polyester resin, and preparation method and application thereof | 江苏睿浦树脂科技有限公司 | 2024-11-19 | — | — | CN | claimed |
| CN-118117949-A | Photovoltaic base and installation method | 浙江福斯特新材料研究院有限公司 | 2024-05-31 | — | — | CN | claimed |
| CN-117186369-A | Hyperbranched nonionic water-based alkyd resin and preparation method thereof | 山西天宁新材料有限公司 | 2023-12-08 | — | — | CN | claimed |
| CN-115011303-B | Double-component high-temperature-resistant high-shear-strength organic silica gel adhesive and preparation method thereof | 忻州师范学院 | 2023-09-08 | — | — | CN | claimed |
| CN-110982397-A | Environment-friendly pure resin impregnated insulating paint with high paint coating amount and preparation method thereof | 清远贝特新材料有限公司 | 2020-04-10 | — | — | CN | claimed |
| EP-0940368-A1 | PROCESS FOR PREPARING In 2?O 3?-SnO 2? PRECURSOR SOL AND PROCESS FOR PREPARING THIN FILM OF In 2?O 3?-SnO 2? | KRI International, Inc. (JP) | 1999-09-08 | — | — | EP | claimed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4700067-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPERSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-25 | — | — | EP | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692941-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-20260029706-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPER STRAIGHT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-29 | — | — | US | disclosed |
| US-12474638-B2 | Underlayer for photoresist adhesion and dose reduction | LAM RESEARCH CORPORATION (US) | 2025-11-18 | — | — | US | disclosed |
| EP-4621486-A2 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-24 | — | — | EP | disclosed |
| WO-1998049207-A1 | BOUND ULTRAVIOLET LIGHT ABSORBERS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1998-11-05 | — | — | WO | disclosed |
| WO-1998026028-A1 | FUEL COMPOSITIONS EXHIBITING IMPROVED FUEL STABILITY | ORR WILLIAM C (US) | 1998-06-18 | — | — | WO | disclosed |
| EP-0782566-A1 | COMPOSITIONS CONTAINING PENTAERYTHRITOL TETRAESTERS AND PROCESS FOR PRODUCTION THEREOF | WITCO CORPORATION (US) | 1997-07-09 | — | — | EP | disclosed |
| EP-0762151-A2 | Optical article with coat and method of making the same | NIKON CORPORATION (JP) | 1997-03-12 | — | — | EP | disclosed |
| WO-1997003954-A1 | COMPOSITIONS CONTAINING PENTAERYTHRITOL TETRAESTERS AND PROCESS FOR PRODUCTION THEREOF | WITCO CORPORATION (US) | 1997-02-06 | — | — | WO | disclosed |
| US-4970126-A | CHROMATE FILM, POLYMER, SILICA | NIPPON KOKAN KABUSHIKI KAISHA (JP) | 1990-11-13 | — | — | US | disclosed |
| EP-0282073-A1 | Highly corrosion-resistant, multi-layer coated steel sheets | NIPPON KOKAN KABUSHIKI KAISHA (JP) | 1988-09-14 | — | — | EP | disclosed |