SCHEMBL3079513

SCHEMBL3079513

N=C(N)NC(=N)N(C1CC2CCC1C2)C1CC2CCC1C2

nearest known ligand 0.32

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 3/20 0.32
GRIN2D O15399 2/20 0.32
GRIN3B O60391 2/20 0.32
GRIN1 Q05586 2/20 0.32
GRIN2A Q12879 2/20 0.32
GRIN2B Q13224 2/20 0.32
GRIN2C Q14957 2/20 0.32
GRIN3A Q8TCU5 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3072036 0.80 SIGMAR1 (0.33) SIGMAR1GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL17710545 0.75 MAPT (0.31)
SCHEMBL6831207 0.73 MAPT (0.34) SIGMAR1GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL3064461 0.72 MAPT (0.35) SIGMAR1GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL3066567 0.72 POLB (0.35) SIGMAR1GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL3068810 0.70 POLB (0.33) SIGMAR1GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL3067587 0.69 MAPT (0.34) SIGMAR1GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL3077475 0.69 SIGMAR1 (0.31) SIGMAR1GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL3059471 0.67 POLB (0.33)
SCHEMBL3082851 0.67 SIGMAR1 (0.50) SIGMAR1GRIN2DGRIN3BGRIN1GRIN2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12264275-B2 Treatment liquid FUJIFILM CORPORATION (JP) 2025-04-01 US disclosed
EP-3719105-B1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MAT USA INC (US) 2023-09-27 EP disclosed
US-11639487-B2 Cleaning formulation for removing residues on surfaces FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2023-05-02 US disclosed
US-11618867-B2 Cleaning formulation for removing residues on surfaces FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2023-04-04 US disclosed
US-20230100080-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2023-03-30 US disclosed
US-20230101156-A1 TREATMENT LIQUID FUJIFILM CORPORATION (JP) 2023-03-30 US disclosed
US-20230066300-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2023-03-02 US disclosed
US-20220275313-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2022-09-01 US disclosed
US-11401487-B2 Cleaning formulation for removing residues on surfaces FUJIFILM ELECTRONICS MATERIALS U.S.A., INC. (US) 2022-08-02 US disclosed
US-11359169-B2 2022-06-14 US disclosed
EP-1472319-A1 NON-TOXIC CORROSION PROTECTION PIGMENTS BASED ON COBALT UNIVERSITY OF DAYTON (US) 2004-11-03 EP disclosed
WO-2004065305-A1 NON-TOXIC CORROSION-PROTECTION PIGMENTS BASED ON MANGANESE UNIVERSITY OF DAYTON (US) 2004-08-05 WO disclosed
US-20040104377-A1 Non-toxic corrosion-protection pigments based on rare earth elements UNIVERSITY OF DAYTON 2004-06-03 US disclosed
US-20040020568-A1 Non-toxic corrosion-protection conversion coats based on rare earth elements DAYTON, UNIVERSITY OF 2004-02-05 US disclosed
US-20040016363-A1 CORROSION-INHIBITING COATING VENTURE LENDING & LEASING, IV, INC. 2004-01-29 US disclosed
US-20040016910-A1 Non-toxic corrosion-protection rinses and seals based on rare earth elements DAYTON, UNIVERSITY OF 2004-01-29 US disclosed
US-20030230363-A1 Non-toxic corrosion-protection rinses and seals based on cobalt UNIVERSITY OF DAYTON 2003-12-18 US disclosed
WO-2003060192-A1 NON-TOXIC CORROSION-PROTECTION RINSES AND SEALS BASED ON COBALT UNIVERSITY OF DAYTON (US) 2003-07-24 WO disclosed
WO-2003060191-A2 NON-TOXIC CORROSION-PROTECTION CONVERSION COATINGES ABSED ON COBALT UNIVERSITY OF DAYTON (US) 2003-07-24 WO disclosed
WO-2003060019-A1 NON-TOXIC CORROSION PROTECTION PIGMENTS BASED ON COBALT UNIVERSITY OF DAYTON (US) 2003-07-24 WO disclosed