SCHEMBL30816384

SCHEMBL30816384

O=C(O)CCCCCCCC(F)C(=O)O

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.63
TSHR P16473 4/20 0.55
LMNA P02545 2/20 0.55
NFKB1 P19838 1/20 0.55
PMP22 Q01453 1/20 0.55
GSTK1 Q9Y2Q3 2/20 0.50
FFAR4 Q5NUL3 3/20 0.48
FFAR1 O14842 3/20 0.48
ALDH1A1 P00352 3/20 0.47
GPR84 Q9NQS5 4/20 0.46
ENPEP Q07075 1/20 0.45
PPARG P37231 4/20 0.44
PPARD Q03181 4/20 0.44
PPARA Q07869 4/20 0.44
HDAC11 Q96DB2 3/20 0.44
TDP1 Q9NUW8 2/20 0.44
SLC22A6 Q4U2R8 1/20 0.44
SLC22A8 Q8TCC7 1/20 0.44
TLR2 O60603 1/20 0.44
MEN1 O00255 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8639483 1.00 MAPT (0.63) MAPTTSHRLMNANFKB1PMP22
SCHEMBL22826568 0.98 MAPT (0.59) MAPTTSHRLMNANFKB1PMP22
SCHEMBL18334377 0.91 MAPT (0.56) MAPTTSHRLMNANFKB1PMP22
SCHEMBL18334378 0.91 MAPT (0.56) MAPTTSHRLMNANFKB1PMP22
SCHEMBL9620798 0.88 MAPT (0.77) MAPTGSTK1FFAR1GPR84PPARD
SCHEMBL9621069 0.88 MAPT (0.77) MAPTGSTK1FFAR1GPR84PPARD
SCHEMBL9620494 0.88 MAPT (0.77) MAPTGSTK1FFAR1GPR84PPARD
SCHEMBL9620682 0.88 MAPT (0.77) MAPTGSTK1FFAR1GPR84PPARD
SCHEMBL9620776 0.85 MAPT (0.73) MAPTFFAR1GPR84PPARDTDP1
SCHEMBL21895805 0.81 TSHR (0.60) TSHRLMNANFKB1PMP22GSTK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025013517-A1 RESIN COMPOSITION, CURED PRODUCT, LAMINATE, AND METHOD FOR PRODUCING CURED PRODUCT 富士フイルム株式会社 2025-01-16 WO disclosed
WO-2024203222-A1 RESIN COMPOSITION, METHOD FOR PRODUCING INTERLAYER INSULATING FILM FOR REWIRING LAYER, AND PHOTOSENSITIVE AGENT 富士フイルム株式会社 2024-10-03 WO disclosed
WO-2024195608-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, MULTILAYER BODY, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING MULTILAYER BODY, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2024-09-26 WO disclosed
WO-2024190733-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2024-09-19 WO disclosed
WO-2024143211-A1 MEMBER, METHOD FOR MANUFACTURING MEMBER, PHOTOSENSITIVE RESIN COMPOSITION, AND SEMICONDUCTOR MEMBER 富士フイルム株式会社 2024-07-04 WO disclosed
WO-2024143210-A1 MEMBER, METHOD FOR MANUFACTURING MEMBER, PHOTOSENSITIVE RESIN COMPOSITION, AND SEMICONDUCTOR MEMBER 富士フイルム株式会社 2024-07-04 WO disclosed
WO-2024143209-A1 METHOD FOR PRODUCING MULTILAYER BODY, PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR MEMBER 富士フイルム株式会社 2024-07-04 WO disclosed
WO-2024143212-A1 METHOD FOR MANUFACTURING LAMINATE, METHOD FOR MANUFACTURING SEMICONDUCTOR MEMBER, PHOTOSENSITIVE RESIN COMPOSITION, LAMINATE, SEMICONDUCTOR MEMBER, AND RESIN COMPOSITION 富士フイルム株式会社 2024-07-04 WO disclosed
WO-2024070963-A1 FILM PRODUCTION METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT PRODUCTION METHOD, CURED PRODUCT, AND LAMINATE 富士フイルム株式会社 2024-04-04 WO disclosed