Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Ammonia Solution, Strong. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL4014016 | 0.87 | — | — | |
| Charcoal, Activated SCHEMBL6066147 | 0.87 | — | — | |
| Ammonia Solution, Strong SCHEMBL5066671 | 0.75 | — | — | |
| Hydrochloric Acid SCHEMBL30101200 | 0.71 | — | — | |
| Hydrochloric Acid SCHEMBL31386984 | 0.71 | — | — | |
| Hydrochloric Acid SCHEMBL29761429 | 0.71 | — | — | |
| Hydrochloric Acid SCHEMBL28502999 | 0.71 | CYP3A4 (0.33) | — | |
| Hydrochloric Acid SCHEMBL29482291 | 0.71 | — | — | |
| Hydrochloric Acid SCHEMBL8027943 | 0.71 | CYP3A4 (0.33) | — | |
| Ammonia Solution, Strong SCHEMBL1862817 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8658010-B2 | Filtered cathodic arc deposition method and apparatus | G & H TECHNOLOGIES, LLC (US) | 2014-02-25 | — | — | US | disclosed |
| US-8282794-B2 | Filtered cathodic arc deposition method and apparatus | G & H TECHNOLOGIES, LLC (US) | 2012-10-09 | — | — | US | disclosed |
| US-20100170781-A1 | Filtered Cathodic Arc Deposition Method and Apparatus | G&H TECHNOLOGIES, LLC | 2010-07-08 | — | — | US | disclosed |
| US-20100170787-A1 | Filtered Cathodic Arc Deposition Method and Apparatus | G&H TECHNOLOGIES, LLC | 2010-07-08 | — | — | US | disclosed |
| US-20080116058-A1 | Filtered cathodic arc deposition method and apparatus | GOROKHOVSKY VLADIMIR | 2008-05-22 | — | — | US | disclosed |
| US-7300559-B2 | Filtered cathodic arc deposition method and apparatus | G & H TECHNOLOGIES LLC (US) | 2007-11-27 | — | — | US | disclosed |
| US-7252745-B2 | Filtered cathodic arc deposition method and apparatus | G & H TECHNOLOGIES, LLC (US) | 2007-08-07 | — | — | US | disclosed |
| US-20040168637-A1 | Filtered cathodic arc deposition method and apparatus | G&H TECHNOLOGIES, LLC | 2004-09-02 | — | — | US | disclosed |
| US-20040103845-A1 | Filtered cathodic arc deposition method and apparatus | G&H TECHNOLOGIES, LLC | 2004-06-03 | — | — | US | disclosed |
| US-6663755-B2 | Filtered cathodic arc deposition method and apparatus | G & H TECHNOLOGIES LLC | 2003-12-16 | — | — | US | disclosed |
| US-20020007796-A1 | Filtered cathodic arc deposition method and apparatus | G & H TECHNOLOGIES LLC | 2002-01-24 | — | — | US | disclosed |