⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29245567 | 0.87 | — | — | |
| SCHEMBL21235179 | 0.82 | — | — | |
| SCHEMBL9845918 | 0.82 | — | — | |
| SCHEMBL18315351 | 0.80 | — | — | |
| SCHEMBL8848619 | 0.78 | OPRM1 (0.50) | — | |
| SCHEMBL18315353 | 0.78 | OPRM1 (0.50) | — | |
| SCHEMBL31532911 | 0.78 | OPRM1 (0.50) | — | |
| SCHEMBL11155476 | 0.78 | OPRM1 (0.50) | — | |
| SCHEMBL18315359 | 0.78 | OPRM1 (0.50) | — | |
| SCHEMBL2024922 | 0.78 | OPRM1 (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 80 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114507164-A | Gemini surfactant, preparation method, composition and application thereof | 中国石油天然气股份有限公司 | 2022-05-17 | — | — | CN | claimed |
| CN-114507164-B | Gemini surfactant, preparation method, composition and application thereof | 中国石油天然气股份有限公司 | 2023-10-24 | — | — | CN | disclosed |
| CN-114507164-A | Gemini surfactant, preparation method, composition and application thereof | 中国石油天然气股份有限公司 | 2022-05-17 | — | — | CN | disclosed |
| WO-2021050900-A1 | RECEPTOR TYROSINE KINASE INHIBITORS FOR TREATMENT OF PROTEIN KINASE MODULATION-RESPONSIVE DISEASE OR DISORDER | THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY, DEPARTMENT OF HEALTH AND HUMAN SERVICES (US) | 2021-03-18 | — | — | WO | disclosed |
| US-10920179-B2 | Cleaning solution and method for cleaning substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-02-16 | — | — | US | disclosed |
| EP-3082819-B1 | SUBSTITUTED DIAMINOPYRIMIDYL COMPOUNDS, COMPOSITIONS THEREOF, AND METHODS OF TREATMENT THEREWITH | SIGNAL PHARM LLC (US) | 2020-06-17 | — | — | EP | disclosed |
| US-20190256805-A1 | CLEANING SOLUTION AND METHOD FOR CLEANING SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-08-22 | — | — | US | disclosed |
| US-10119103-B2 | Cleaning liquid and method for cleaning | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-11-06 | — | — | US | disclosed |
| EP-3061752-B1 | SUBSTITUTED PYRIDAZINE CARBOXAMIDE COMPOUNDS AS KINASE INHIBITOR COMPOUNDS | XCOVERY HOLDING CO LLC (US) | 2018-02-21 | — | — | EP | disclosed |
| US-20170253840-A1 | CLEANING LIQUID AND METHOD FOR CLEANING | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-09-07 | — | — | US | disclosed |
| US-20020086167-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2002-07-04 | — | — | US | disclosed |
| US-6413647-B1 | USEFUL AS INTERLAYER DIELECTRIC FILM IN SEMICONDUCTOR DEVICES; MECHANICAL STRENGTH | JSR CORPORATION (JP) | 2002-07-02 | — | — | US | disclosed |
| US-6410151-B1 | Composition for film formation, method of film formation, and insulating film | JSR CORPORATION (JP) | 2002-06-25 | — | — | US | disclosed |
| US-6410150-B1 | Composition for film formation, method of film formation, and insulating film | JSR CORPORATION (JP) | 2002-06-25 | — | — | US | disclosed |
| US-20010018129-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| US-4428983-A | INTERFACIAL POLYMERIZATION | BAYER AKTIENGESELLSCHAFT (DE) | 1984-01-31 | — | — | US | disclosed |