SCHEMBL3091759

SCHEMBL3091759

C=CCCCCCCC[Si](OC)(OC)OC

nearest known ligand 0.46

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.46
LMNA P02545 4/20 0.44
ALDH1A1 P00352 4/20 0.44
LPAR3 Q9UBY5 2/20 0.39
MAPT P10636 3/20 0.35
ABCC4 O15439 1/20 0.35
LPAR2 Q9HBW0 1/20 0.35
TRPA1 O75762 1/20 0.33
TRPV1 Q8NER1 1/20 0.33
USP2 O75604 2/20 0.32
CYP3A4 P08684 2/20 0.32
SMN1; SMN2 Q16637 2/20 0.32
RECQL P46063 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
HPGD P15428 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1229892 1.00 TSHR (0.46) TSHRLMNAALDH1A1LPAR3MAPT
SCHEMBL444717 1.00 TSHR (0.46) TSHRLMNAALDH1A1LPAR3MAPT
SCHEMBL340911 1.00 TSHR (0.46) TSHRLMNAALDH1A1LPAR3MAPT
SCHEMBL138043 1.00 TSHR (0.46) TSHRLMNAALDH1A1LPAR3MAPT
SCHEMBL1228462 1.00 TSHR (0.46) TSHRLMNAALDH1A1LPAR3MAPT
SCHEMBL6037442 1.00 TSHR (0.46) TSHRLMNAALDH1A1LPAR3MAPT
SCHEMBL630825 1.00 TSHR (0.46) TSHRLMNAALDH1A1LPAR3MAPT
SCHEMBL6037453 1.00 TSHR (0.46) TSHRLMNAALDH1A1LPAR3MAPT
SCHEMBL6037374 1.00 TSHR (0.46) TSHRLMNAALDH1A1LPAR3MAPT
SCHEMBL6037371 1.00 TSHR (0.46) TSHRLMNAALDH1A1LPAR3MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2216682-B1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST ADEKA CORP (JP) 2013-07-17 EP disclosed
US-8211619-B2 Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist ADEKA CORPORATION (JP) 2012-07-03 US disclosed
US-20100273104-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST A D E K A (ADEKA CORPORATION) (JP) 2010-10-28 US disclosed
EP-2216682-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST Adeka Corporation (JP) 2010-08-11 EP disclosed