SCHEMBL309203

SCHEMBL309203

CCCCONCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21314157 0.92
SCHEMBL10520128 0.89 CA1 (0.43)
SCHEMBL10606108 0.89 CA1 (0.43)
SCHEMBL18628622 0.89 CA1 (0.43)
SCHEMBL9766772 0.89 CA1 (0.43)
SCHEMBL11519105 0.89 CA1 (0.43)
SCHEMBL1109711 0.89 CA1 (0.43)
SCHEMBL309238 0.81
SCHEMBL455723 0.81 TP53 (0.31)
SCHEMBL309211 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 119 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3758947-B1 HEAT SENSITIVE RECORDING MATERIAL AND COLOR DEVELOPER SOLENIS TECHNOLOGIES CAYMAN LP (KY) 2025-05-14 EP disclosed
US-11591354-B2 Thiamine compound, preparation method and pharmaceutical composition thereof SHANGHAI RAISING PHARMACEUTICAL CO., LTD. (CN) 2023-02-28 US disclosed
CN-112601668-B Thermosensitive recording material and color-developing agent 索理思科技开曼公司 2022-07-29 CN disclosed
CN-111689998-B Synthesis method of bis (ethylamino) dicyclopentyl silane 扬州三友合成化工有限公司 2022-04-15 CN disclosed
US-20220089621-A1 THIAMINE COMPOUND, PREPARATION METHOD AND PHARMACEUTICAL COMPOSITION THEREOF SHANGHAI RAISING PHARMACEUTICAL CO., LTD. (CN) 2022-03-24 US disclosed
EP-3889160-A1 THIAMINE COMPOUND, PREPARATION METHOD AND PHARMACEUTICAL COMPOSITION THEREOF Shanghai Raising Pharmaceutical Co., Ltd. (CN) 2021-10-06 EP disclosed
CN-112601668-A Thermosensitive recording material and color-developing agent 索理思科技开曼公司 2021-04-02 CN disclosed
CN-108699694-B Electroless plating base agent comprising highly branched polymer and metal fine particles 日产化学株式会社 2021-03-12 CN disclosed
US-10920179-B2 Cleaning solution and method for cleaning substrate TOKYO OHKA KOGYO CO., LTD. (JP) 2021-02-16 US disclosed
EP-3758947-A1 HEAT SENSITIVE RECORDING MATERIAL AND COLOR DEVELOPER Solenis Technologies Cayman, L.P. (KY) 2021-01-06 EP disclosed
EP-0668852-A1 SUBSTITUTED ORTHO-ETHENYL-PHENYL ACETIC ACID DERIVATIVES BASF Aktiengesellschaft (DE) 1995-08-30 EP disclosed
US-5288315-A Aqueous electrodepositable or alkaline paints including a bind binder and a corrosion inhibitor comprising a mono-, di- or polyazo-methine; metal substrates CIBA-GEIGY CORPORATION (US) 1994-02-22 US disclosed
EP-0340828-A1 5-Fluoromethyl-1,2,4-triazolo(1,5-a)-pyrimidine-2-sulfonamides, process for their preparation and compositions for their use as herbicides DowElanco (US) 1989-11-08 EP disclosed
WO-1988003544-A1 AMIDE MODIFIED EPOXY RESINS THE DOW CHEMICAL COMPANY (US) 1988-05-19 WO disclosed
EP-0266694-A2 Amide modified epoxy resins THE DOW CHEMICAL COMPANY (US) 1988-05-11 EP disclosed
US-4721742-A Amide modified epoxy resins from a dialkanolamine, a monoalkanolamine, an anhydride and (an) unsaturated monomer(s) THE DOW CHEMICAL COMPANY (US) 1988-01-26 US disclosed
US-4433127-A SILYL ISOCYANATE, ORGANO-TITANIUM-OXYGEN-PHOSPHORUS COMPOUND MATSUMOTO SEIYAKU KOGYO KABUSHIKI KAISHA (JP) 1984-02-21 US disclosed
US-4253886-A Corrosion resistant ferromagnetic metal powders and method of preparing the same FUJI PHOTO FILM CO., LTD. (JP) 1981-03-03 US disclosed
US-4153634-A HYDROLYTIC CRACKING RHODIA, INC. (US) 1979-05-08 US disclosed
US-4153633-A HYDROLYSIS RHODIA, INC. (US) 1979-05-08 US disclosed