SCHEMBL309211

SCHEMBL309211

CCCCONCCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23406865 0.97 ADRB2 (0.38)
SCHEMBL3263919 0.92 CA1 (0.39)
SCHEMBL446394 0.90 CA1 (0.41)
SCHEMBL10822147 0.90 CA1 (0.41)
SCHEMBL3831317 0.90 CA1 (0.41)
SCHEMBL4879826 0.90 CA1 (0.41)
SCHEMBL7920142 0.90 CA1 (0.41)
SCHEMBL179762 0.90 CA1 (0.41)
SCHEMBL444025 0.90 CA1 (0.41)
SCHEMBL7613209 0.90 CA1 (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 205 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12486444-B2 Synergistic performance of amine blends in shale control HUNTSMAN PETROCHEMICAL LLC 2025-12-02 US claimed
CN-116904059-A Aluminum alloy deinking agent and preparation method and application thereof 广东红日星实业有限公司 2023-10-20 CN claimed
CN-112209862-A Preparation process of alkoxycarbonyl thiourea 沈阳有色金属研究院有限公司 2021-01-12 CN claimed
US-10731109-B2 Post chemical mechanical polishing formulations and method of use ENTEGRIS, INC. (US) 2020-08-04 US claimed
WO-2018191424-A1 POST CHEMICAL MECHANICAL POLISHING FORMULATIONS AND METHOD OF USE ENTEGRIS, INC. (US) 2018-10-18 WO claimed
US-20180291309-A1 POST CHEMICAL MECHANICAL POLISHING FORMULATIONS AND METHOD OF USE TRUIST BANK, AS NOTES COLLATERAL AGENT 2018-10-11 US claimed
US-9233420-B2 Fine metal particles and fine metal oxide particles in dry powder form, and use thereof HARIMA CHEMICALS, INC. (JP) 2016-01-12 US claimed
US-20140178581-A1 FINE METAL PARTICLES AND FINE METAL OXIDE PARTICLES IN DRY POWDER FORM, AND USE THEREOF HARIMA CHEMICALS, INC. (JP) 2014-06-26 US claimed
US-8758475-B2 Fine metal particles and fine metal oxide particles in dry powder form, and use thereof HARIMA CHEMICALS, INC. (JP) 2014-06-24 US claimed
US-20090048439-A1 Isolation of nucleic acids molecules using modified solid supports ELITECH HOLDING B.V. (NL) 2009-02-19 US claimed
WO-2009020609-A2 ISOLATION OF NUCLEIC ACIDS MOLECULES USING MODIFIED SOLID SUPPORTS NANOGEN, INC. (US) 2009-02-12 WO claimed
US-6478834-B2 USE OF A POLISHING GRAIN, AN OXIDIZING AGENT AND A HIGHER-MONO-PRIMARY AMINE SUPPRESSES DISHING AND EROSION WHEN FORMING A BURIED INTERCONNECTION OF A COPPER-BASED METAL ON A TANTALUM BASED BARRIER FILM NEC CORP. (JP) 2002-11-12 US claimed
US-20020104268-A1 Slurry for chemical mechanical polishing NEC CORPORATION 2002-08-08 US claimed
US-5652318-A USING A MIXTURE OF HARDENERS, ONE OF WHICH IS A POLYOXYALKYLENE GLYCOL ENDCAPPED WITH AMINO GROUPS AND CONTAINING URETHANE GROUPS HUELS AKTIENGESELLSCHAFT (DE) 1997-07-29 US claimed
EP-0748845-A1 Process for production of flexible epoxy-resin systems HÜLS AKTIENGESELLSCHAFT (DE) 1996-12-18 EP claimed
US-4239549-A Easily water-dispersed formulations of finely divided phthalocyanines BASF AKTIENGESELLSCHAFT (DE) 1980-12-16 US claimed
EP-4634965-A1 SOLUTION FOR POST ETCH RESIDUE REMOVAL (PERR) BASF SE (DE) 2025-10-22 EP disclosed
EP-4634963-A1 SOLUTION FOR POST ETCH RESIDUE REMOVAL (PERR) BASF SE (DE) 2025-10-22 EP disclosed
US-4007192-A DYE INTERMEDIATES HOECHST AKTIENGESELLSCHAFT (DT) 1977-02-08 US disclosed
US-3931186-A Process for preparing naphtholyene arylimidazol-peri-dicarboxylic acid imides HOECHST AKTIENGESELLSCHAFT (DT) 1976-01-06 US disclosed