SCHEMBL30944682

SCHEMBL30944682

O=C1c2ccccc2Cc2cccc(-c3ccc(O)cc3)c21

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOA P21397 1/20 0.53
MIF P14174 5/20 0.51
ALDH1A1 P00352 4/20 0.47
MAPT P10636 2/20 0.47
MEN1 O00255 1/20 0.47
USP2 O75604 1/20 0.47
HPN P05981 1/20 0.47
CYP3A4 P08684 1/20 0.47
ALOX5 P09917 1/20 0.47
THRB P10828 1/20 0.47
ALOX15 P16050 1/20 0.47
TSHR P16473 1/20 0.47
PTGS1 P23219 1/20 0.47
PDE4A P27815 1/20 0.47
KDR P35968 1/20 0.47
KMT2A Q03164 1/20 0.47
HSD17B10 Q99714 1/20 0.47
TDP1 Q9NUW8 1/20 0.47
SIRT5 Q9NXA8 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9395404 1.00 MAOA (0.53) MAOAMIFALDH1A1MAPTMEN1
SCHEMBL9395424 0.89 MAOA (0.49) MAOAMIFALDH1A1MAPTMEN1
SCHEMBL3271360 0.86 MAOA (0.61) MAOAMIFALDH1A1MAPTMEN1
SCHEMBL769934 0.82 MAOA (0.71) MAOAMIFALDH1A1MAPTMEN1
SCHEMBL28571844 0.82 MAOA (0.47) MAOAMIFALDH1A1MAPTMEN1
SCHEMBL27770268 0.81 MAOA (0.53) MAOAMIFALDH1A1MAPTMEN1
SCHEMBL28831017 0.81 BCHE (0.46) MAOAMIFALDH1A1CES1BCHE
SCHEMBL28462061 0.80 MAOA (0.45) MAOAALDH1A1MAPTMEN1USP2
SCHEMBL1204733 0.80 MAPT (0.75) MAOAMIFALDH1A1MAPTMEN1
SCHEMBL29549838 0.80 MAPT (0.75) MAOAMIFALDH1A1MAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4676999-A1 SULFUR-CONTAINING HETEROCYCLIC COMPOUNDS AND THERMOPLASTIC RESINS MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2026-01-14 EP disclosed
EP-4626854-A1 BINAPHTHYL COMPOUNDS AND THERMOPLASTIC RESINS Mitsubishi Gas Chemical Company, Inc. (JP) 2025-10-08 EP disclosed
WO-2024185904-A1 SULFUR-CONTAINING HETEROCYCLIC COMPOUNDS AND THERMOPLASTIC RESINS MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-09-12 WO disclosed