⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL9676922 | 0.94 | — | — | |
| SCHEMBL618285 | 0.75 | — | — | |
| SCHEMBL181526 | 0.72 | — | — | |
| SCHEMBL27490342 | 0.71 | — | — | |
| SCHEMBL25173757 | 0.69 | TSHR (0.44) | — | |
| SCHEMBL22370100 | 0.69 | — | — | |
| SCHEMBL22370084 | 0.69 | TSHR (0.44) | — | |
| SCHEMBL29259770 | 0.69 | — | — | |
| Hydrochloric Acid SCHEMBL28902554 | 0.67 | — | — | |
| 1,2-Dichloroethane SCHEMBL700874 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 914 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117363057-A | Method for manufacturing normal temperature solidified ceramic hydrophobic ash-proof anti-reflection film coating | 中山市旌旗飞扬纳米科技有限公司 | 2024-01-09 | — | — | CN | claimed |
| CN-117210798-A | Method for depositing metal-free ALD silicon nitride films using halide-based precursors | 朗姆研究公司 | 2023-12-12 | — | — | CN | claimed |
| CN-113097487-B | Silicon-carbon composite material with highly compact structure, and preparation method and application thereof | 广东凯金新能源科技股份有限公司 | 2022-11-22 | — | — | CN | claimed |
| CN-114901669-A | Selective production of vinyl-and ethyl-functionalized chlorosilanes | 美国陶氏有机硅公司 | 2022-08-12 | — | — | CN | claimed |
| CN-114008056-A | Process for obtaining hexachlorodisilane by reacting at least one partially hydrogenated chloroethsilane on a solid non-functionalized adsorbent | 瓦克化学股份公司 | 2022-02-01 | — | — | CN | claimed |
| CN-107252697-B | A kind of high activity and high stability solid super-strong acid and preparation method thereof | 南京林业大学 | 2019-06-25 | — | — | CN | claimed |
| CN-107252697-A | A kind of high activity and high stability solid super-strong acid and preparation method thereof | 南京林业大学 | 2017-10-17 | — | — | CN | claimed |
| US-20170178899-A1 | DIRECTIONAL DEPOSITION ON PATTERNED STRUCTURES | LAM RESEARCH CORPORATION | 2017-06-22 | — | — | US | claimed |
| US-8920931-B2 | Phosphosiloxane resins, and curable silicone compositions, free-standing films, and laminates comprising the phosphosiloxane resins | DOW CORNING CORPORATION (US) | 2014-12-30 | — | — | US | claimed |
| EP-2609137-A1 | PHOSPHOSILOXANE RESINS, AND CURABLE SILICONE COMPOSITIONS, FREE-STANDING FILMS, AND LAMINATES COMPRISING THE PHOSPHOSILOXANE RESINS | Dow Corning Corporation (US) | 2013-07-03 | — | — | EP | claimed |
| WO-2012027337-A1 | PHOSPHOSILOXANE RESINS, AND CURABLE SILICONE COMPOSITIONS, FREE-STANDING FILMS, AND LAMINATES COMPRISING THE PHOSPHOSILOXANE RESINS | DOW CORNING CORPORATION (US) | 2012-03-01 | — | — | WO | claimed |
| CN-101510602-B | Method for preparing silicon composite cathode material of lithium ion battery | UNIV SHANGHAI JIAOTONG | 2010-11-03 | — | — | CN | claimed |
| CN-101510602-A | Method for preparing silicon composite cathode material of lithium ion battery | UNIV SHANGHAI JIAOTONG (CN) | 2009-08-19 | — | — | CN | claimed |
| CN-1199218-C | Method for creating field electron emission material and field electron emitter comprising said material | PRINTABLE EMITTERS LTD (GB) | 2005-04-27 | — | — | CN | claimed |
| US-5968611-A | VAPOR DEPOSITION OF SILICON NITRIDE FILMS ON A SUBSTRATE BY REACTION OF HALOALKYLSILANE WITH NITROGEN COMPOUND | THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) | 1999-10-19 | — | — | US | claimed |
| WO-1999027154-A1 | SILICON NITROGEN-BASED FILMS AND METHOD OF MAKING THE SAME | GELEST, INC. (US) | 1999-06-03 | — | — | WO | claimed |
| WO-1998020395-A1 | METHOD OF APPLYING DRY FILM PHOTORESIST | W.L. GORE & ASSOCIATES, INC. (US) | 1998-05-14 | — | — | WO | claimed |
| EP-0079043-B1 | PROCESS FOR THE PREPARATION OF 2-CHLOROETHYL SILANES | Wacker-Chemie GmbH (DE) | 1985-08-21 | — | — | EP | claimed |
| US-4405804-A | Method for preparing 2-chloroethylsilanes | WACKER-CHEMIE GMBH (DE) | 1983-09-20 | — | — | US | claimed |
| EP-0079043-A1 | Process for the preparation of 2-chloroethyl silanes | Wacker-Chemie GmbH (DE) | 1983-05-18 | — | — | EP | claimed |