SCHEMBL3100340

SCHEMBL3100340

CCC(C)O[Al](C(C)C)C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL105382 0.75 TSHR (0.32)
SCHEMBL706455 0.73
SCHEMBL28141439 0.71
SCHEMBL29114733 0.71 TSHR (0.35)
SCHEMBL9246393 0.71 MAPK1 (0.30)
SCHEMBL9248856 0.71
SCHEMBL9725508 0.71
SCHEMBL833622 0.69
SCHEMBL31135452 0.69 LMNA (0.30)
SCHEMBL28208585 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118271876-A Organic-inorganic hybrid coating composition and coating, method of preparing the same, and article comprising the organic-inorganic hybrid coating 比亚迪股份有限公司 2024-07-02 CN claimed
CN-104093667-B Silica ball material with novel feature characteristic 株式会社徳山 2018-03-23 CN disclosed
EP-1591419-B1 FINE SILICA PARTICLES TOKUYAMA CORP (JP) 2017-11-15 EP disclosed
CN-104649282-B Dry-process fine silica particle 株式会社德山 2017-06-13 CN disclosed
EP-2028158-B1 DRY-PROCESS FOR THE PREPARATION OF SILICA PARTICLES TOKUYAMA CORP (JP) 2017-01-18 EP disclosed
CN-104649282-A Dry-Process Fine Silica Particle TOKUYAMA CORP 2015-05-27 CN disclosed
CN-104093667-A Silica balloon material having novel characteristic profiles TOKUYAMA SILTECH CO LTD 2014-10-08 CN disclosed
US-7803341-B2 Fine dry silica particles TOKUYAMA CORPORATION (JP) 2010-09-28 US disclosed
CN-100569642-C fine silica particles TOKUYAMA CORP (JP) 2009-12-16 CN disclosed
US-20090253851-A1 FINE DRY SILICA PARTICLES MITSUBISHI ELECTRIC CORPORATION (JP) 2009-10-08 US disclosed
CN-101454246-A Dry silica fine particles TOKUYAMA CORP (JP) 2009-06-10 CN disclosed
EP-2028158-A1 DRY-PROCESS FINE SILICA PARTICLE TOKUYAMA CORPORATION (JP) 2009-02-25 EP disclosed
US-7452599-B2 Fine silica particles having specific fractal structure parameter TOKUYAMA CORPORATION (JP) 2008-11-18 US disclosed
US-20060150527-A1 Slica fine particles TOKUYAMA CORPORATION (JP) 2006-07-13 US disclosed
CN-1756720-A Silica fine particles TOKUYAMA CORP (JP) 2006-04-05 CN disclosed
EP-1591419-A1 SLICA FINE PARTICLES Tokuyama Corporation (JP) 2005-11-02 EP disclosed