Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | GLA | P06280 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | TP53 | P04637 | 1/20 | 0.35 |
| ▸ | SAT1 | P21673 | 2/20 | 0.32 |
| ▸ | KDM1A | O60341 | 5/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7084623 | 0.83 | ALDH1A1 (0.35) | — | |
| SCHEMBL13078382 | 0.80 | CYP2C19 (0.45) | CYP2C19MEN1GLAKMT2ACYP1A2 | |
| SCHEMBL28354717 | 0.75 | CA12 (0.52) | CYP2C19MEN1KMT2ACYP1A2TSHR | |
| SCHEMBL9950060 | 0.75 | CA12 (0.52) | CYP2C19MEN1KMT2ACYP1A2TSHR | |
| SCHEMBL1720452 | 0.75 | — | — | |
| SCHEMBL1061677 | 0.74 | — | — | |
| SCHEMBL80292 | 0.72 | — | — | |
| SCHEMBL3107552 | 0.72 | — | — | |
| SCHEMBL339968 | 0.70 | — | — | |
| SCHEMBL4667751 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102272675-A | A photoresist image-forming process using double patterning | — | 2011-12-07 | — | — | CN | claimed |
| US-20100183851-A1 | Photoresist Image-forming Process Using Double Patterning | CAO YI | 2010-07-22 | — | — | US | claimed |
| EP-2146250-B1 | WATER-SOLUBLE RESIN COMPOSITION FOR THE FORMATION OF MICROPATTERNS AND PROCESS FOR THE FORMATION OF MICROPATTERNS WITH THE SAME | MERCK PATENT GMBH (DE) | 2017-08-23 | — | — | EP | disclosed |
| CN-101675390-B | Water-soluble resin composition for the formation of micropatterns and process for the formation of micropatterns with the same | AZ ELECTRONIC MATERIALS JAPAN | 2012-07-18 | — | — | CN | disclosed |
| CN-102272675-A | A photoresist image-forming process using double patterning | — | 2011-12-07 | — | — | CN | disclosed |
| US-20100183851-A1 | Photoresist Image-forming Process Using Double Patterning | CAO YI | 2010-07-22 | — | — | US | disclosed |
| US-20100119717-A1 | WATER-SOLUBLE RESIN COMPOSITION FOR THE FORMATION OF MICROPATTERNS AND METHOD FOR THE FORMATION OF MICROPATTERNS WITH THE SAME | HONG SUNG-EUN | 2010-05-13 | — | — | US | disclosed |
| CN-101675390-A | Water-soluble resin composition for the formation of micropatterns and process for the formation of micropatterns with the same | AZ ELECTRONIC MATERIALS JAPAN | 2010-03-17 | — | — | CN | disclosed |
| EP-2146250-A1 | WATER-SOLUBLE RESIN COMPOSITION FOR THE FORMATION OF MICROPATTERNS AND PROCESS FOR THE FORMATION OF MICROPATTERNS WITH THE SAME | AZ Electronic Materials (Japan) K.K. (JP) | 2010-01-20 | — | — | EP | disclosed |