SCHEMBL3102899

SCHEMBL3102899

C=CC(=O)OCCOc1ccc(Sc2ccc(OCCOC(=O)C=C)cc2)cc1

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 5/20 0.71
TSHR P16473 6/20 0.48
ALDH1A1 P00352 4/20 0.48
TP53 P04637 2/20 0.48
HIF1A Q16665 2/20 0.48
HSD17B10 Q99714 1/20 0.48
HPGD P15428 2/20 0.44
CYP3A4 P08684 1/20 0.44
SMN1; SMN2 Q16637 4/20 0.41
LMNA P02545 2/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
GAA P10253 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
HTT P42858 1/20 0.39
PKM P14618 1/20 0.39
MAPT P10636 1/20 0.39
RECQL P46063 1/20 0.38
NPC1 O15118 1/20 0.37
RAB9A P51151 1/20 0.37
PARP10 Q53GL7 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14173241 1.00 THRB (0.71) THRBTSHRALDH1A1TP53HIF1A
SCHEMBL25118381 0.95 THRB (0.65) THRBTSHRALDH1A1TP53HIF1A
SCHEMBL25118326 0.95 THRB (0.65) THRBTSHRALDH1A1TP53HIF1A
SCHEMBL15500165 0.93 THRB (0.61) THRBTSHRALDH1A1TP53HIF1A
SCHEMBL15500106 0.93 THRB (0.61) THRBTSHRALDH1A1TP53HIF1A
SCHEMBL14173245 0.92 THRB (0.59) THRBTSHRALDH1A1TP53HIF1A
SCHEMBL14173243 0.92 THRB (0.59) THRBTSHRALDH1A1TP53HIF1A
SCHEMBL9489063 0.91 THRB (0.83) THRBTSHRALDH1A1TP53HIF1A
SCHEMBL2721790 0.89 THRB (0.65) THRBTSHRALDH1A1TP53HIF1A
SCHEMBL25118385 0.89 THRB (0.57) THRBTSHRALDH1A1TP53HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7799844-B2 Active energy beam-curable composition for optical material TOAGOSEI CO., LTD. (JP) 2010-09-21 US claimed
US-20070043143-A1 Active energy beam-curable composition for optical material THOMSON LICENSING (FR) 2007-02-22 US claimed
US-9477354-B2 Conductive trace hiding materials, articles, and methods 3M INNOVATIVE PROPERTIES COMPANY (US) 2016-10-25 US disclosed
CN-104781768-A Materials, articles, and methods of concealing conductive traces 3M INNOVATIVE PROPERTIES CO 2015-07-15 CN disclosed
EP-2586799-B1 COMPOSITION FOR COLLOIDAL CRYSTAL NOF CORP (JP) 2015-01-07 EP disclosed
US-8906505-B2 Composition for colloidal crystal comprising core-shell particles and styrene polymer NOF CORPORATION (JP) 2014-12-09 US disclosed
US-8906505-B2 Composition for colloidal crystal comprising core-shell particles and styrene polymer NOF CORPORATION (JP) 2014-12-09 US disclosed
US-8906505-B2 Composition for colloidal crystal comprising core-shell particles and styrene polymer NOF CORPORATION (JP) 2014-12-09 US disclosed
US-20140138131-A1 CONDUCTIVE TRACE HIDING MATERIALS, ARTICLES, AND METHODS 3M INNOVATIVE PROPERTIES COMPANY (US) 2014-05-22 US disclosed
US-8669030-B2 Electrophotographic photoreceptor, and image forming method and apparatus using the same RICOH COMPANY, LIMITED (JP) 2014-03-11 US disclosed
US-20130171438-A1 COMPOSITION FOR COLLOIDAL CRYSTAL NOF CORPORATION (JP) 2013-07-04 US disclosed
EP-1477529-A1 TRANSPARENT COMPOSITE COMPOSITION SUMITOMO BAKELITE CO., LTD. (JP) 2004-11-17 EP disclosed
US-20040126592-A1 Transparent composite composition SUMITOMO BAKELITE CO., LTD. (JP) 2004-07-01 US disclosed
US-6570025-B1 Photopolymerization MITSUI CHEMICALS, INC. (JP) 2003-05-27 US disclosed
EP-1302471-A1 SULFUR COMPOUND AND USE THEREOF Mitsui Chemicals, Inc. (JP) 2003-04-16 EP disclosed
US-6458908-B1 A PROCESS FOR PREPARING A SULFUR-CONTAINING UNSATURATED CARBOXYLATE COMPOUND AS CLAIMED IN CLAIM 1 COMPRISING REACTING A SULFUR-CONTAINING DERIVATIVE FOR OPTICAL POLYMERS MITSUI CHEMICALS, INC. (JP) 2002-10-01 US disclosed
EP-1057808-A2 Sulfur-containing unsaturated carboxylate compound and its use Mitsui Chemicals, Inc. (JP) 2000-12-06 EP disclosed
US-5191061-A High impact, radiation transparent plastic for lenses Misubishi Petrochemical Co., Ltd. (JP) 1993-03-02 US disclosed
US-5171806-A Phenylmaleimide, dially diphenate, bisphenol ester; lenses NIPPON SHEET GLASS CO., LTD. (JP) 1992-12-15 US disclosed
EP-0482572-A1 Resin for high-refraction lens MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1992-04-29 EP disclosed