SCHEMBL3103152

SCHEMBL3103152

C=C(c1ccccc1)c1ccc(C(=O)O)cc1

nearest known ligand 0.70

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.70
DAO P14920 1/20 0.70
NAPRT Q6XQN6 1/20 0.70
CES2 O00748 3/20 0.65
CES1 P23141 3/20 0.65
SRD5A2 P31213 2/20 0.65
TP53 P04637 1/20 0.60
MEN1 O00255 2/20 0.54
KMT2A Q03164 2/20 0.54
TRPA1 O75762 1/20 0.52
CA1 P00915 3/20 0.50
CA2 P00918 3/20 0.50
CA12 O43570 2/20 0.50
CA9 Q16790 2/20 0.50
CYP2C8 P10632 1/20 0.50
CYP2C9 P11712 1/20 0.50
CA3 P07451 1/20 0.50
TYR P14679 1/20 0.50
DRD1 P21728 1/20 0.50
CA4 P22748 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzoic Acid SCHEMBL28138258 0.97 TSHR (0.74) TSHRDAONAPRTCES2CES1
SCHEMBL8528933 0.92 TSHR (0.71) TSHRDAONAPRTCES2CES1
Paraben SCHEMBL18247790 0.91 CA12 (0.67) TSHRDAONAPRTCES2CES1
Bicarbonate SCHEMBL1325151 0.87 CES1 (0.55) TSHRDAONAPRTCES2CES1
Terephthalic Acid SCHEMBL4961359 0.87 TSHR (0.93) TSHRDAONAPRTCES2CES1
SCHEMBL894135 0.87 MEN1 (0.65) TSHRDAONAPRTCES2CES1
Bicarbonate SCHEMBL28111183 0.84 CES1 (0.52) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL434647 0.84 TSHR (0.88) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL1615025 0.84 TSHR (0.88) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL20574965 0.84 TSHR (0.88) TSHRDAONAPRTCES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2216682-B1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST ADEKA CORP (JP) 2013-07-17 EP disclosed
CN-102112922-B Positive photosensitive composition and permanent resist ADEKA CORP 2012-12-26 CN disclosed
CN-101855598-B Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist ADEKA CORP 2012-08-08 CN disclosed
US-8211619-B2 Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist ADEKA CORPORATION (JP) 2012-07-03 US disclosed
CN-102112922-A Positive photosensitive composition and permanent resist ADEKA CORP 2011-06-29 CN disclosed
US-7932213-B2 Solid phase synthesis with benzylidene linker attaching compound on glass slide; microarrays; drug screening PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2011-04-26 US disclosed
US-20100273104-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST A D E K A (ADEKA CORPORATION) (JP) 2010-10-28 US disclosed
CN-101855598-A Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist ADEKA CORP 2010-10-06 CN disclosed
EP-2216682-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST Adeka Corporation (JP) 2010-08-11 EP disclosed
US-5998433-A THERAPY FOR HYPERLIPIDEMIA; ATHEROSCLEROSIS TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1999-12-07 US disclosed
CN-1160403-A Substd. heterobicyclic alkyl amines and their use as squalene oxide cyclase inhibitors TAKEDA CHEMICAL INDUSTRIES LTD (JP) 1997-09-24 CN disclosed
EP-0785939-A1 SUBSTITUTED HETEROBICYCLIC ALKYL AMINES AND THEIR USE AS SQUALENE OXIDE CYCLASE INHIBITORS Takeda Chemical Industries, Ltd. (JP) 1997-07-30 EP disclosed
EP-0570932-B1 Styrenic block copolymer and process for producing same IDEMITSU KOSAN CO (JP) 1997-07-23 EP disclosed
WO-1996011201-A1 SUBSTITUTED HETEROBICYCLIC ALKYL AMINES AND THEIR USE AS SQUALENE OXIDE CYCLASE INHIBITORS TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1996-04-18 WO disclosed
US-5418290-A Compatability with other resins, adhesion IDEMITSU KOSAN CO., LTD. (JP) 1995-05-23 US disclosed
US-5391626-A Syndiotactic, high performance, compatibility and adhesiveness; molding materials IDEMITSU KOSAN CO., LTD. (JP) 1995-02-21 US disclosed
EP-0570932-A2 Styrenic block copolymer and process for producing same IDEMITSU KOSAN COMPANY LIMITED (JP) 1993-11-24 EP disclosed