⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL660751 | 0.69 | — | — | |
| SCHEMBL28490351 | 0.65 | TSHR (0.33) | — | |
| SCHEMBL2103202 | 0.62 | — | — | |
| SCHEMBL10615974 | 0.62 | — | — | |
| SCHEMBL1586506 | 0.62 | ALDH1A1 (0.39) | — | |
| SCHEMBL8759781 | 0.61 | — | — | |
| SCHEMBL2274415 | 0.61 | — | — | |
| SCHEMBL2100921 | 0.60 | — | — | |
| SCHEMBL2272321 | 0.58 | — | — | |
| SCHEMBL4492329 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4108706-B1 | METHOD FOR PRODUCING CYCLIC POLYSILOXANE | SHINETSU CHEMICAL CO (JP) | 2025-09-10 | — | — | EP | disclosed |
| US-20230095953-A1 | METHOD FOR PRODUCING CYCLIC POLYSILOXANE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-03-30 | — | — | US | disclosed |
| EP-4108706-A1 | METHOD FOR PRODUCING CYCLIC POLYSILOXANE | Shin-Etsu Chemical Co., Ltd. (JP) | 2022-12-28 | — | — | EP | disclosed |
| CN-115135698-A | Method for producing cyclic polysiloxane | 信越化学工业株式会社 | 2022-09-30 | — | — | CN | disclosed |
| EP-2216682-B1 | POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST | ADEKA CORP (JP) | 2013-07-17 | — | — | EP | disclosed |
| US-8211619-B2 | Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist | ADEKA CORPORATION (JP) | 2012-07-03 | — | — | US | disclosed |
| US-20100273104-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST | A D E K A (ADEKA CORPORATION) (JP) | 2010-10-28 | — | — | US | disclosed |
| EP-2216682-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST | Adeka Corporation (JP) | 2010-08-11 | — | — | EP | disclosed |