⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15547012 | 0.75 | TET2 (0.33) | — | |
| SCHEMBL2791394 | 0.75 | — | — | |
| SCHEMBL1006667 | 0.75 | — | — | |
| SCHEMBL8900415 | 0.73 | SLC7A5 (0.38) | — | |
| SCHEMBL1227973 | 0.71 | TET2 (0.31) | — | |
| SCHEMBL9745536 | 0.71 | — | — | |
| SCHEMBL1519059 | 0.71 | — | — | |
| SCHEMBL471880 | 0.71 | — | — | |
| SCHEMBL5543015 | 0.69 | TET2 (0.32) | — | |
| SCHEMBL6063762 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4656669-A1 | FLUORINATED COPOLYMERS BASED ON AN OLIGO(2-OXAZOLINE) MACROMONOMER | ARKEMA FRANCE (FR) | 2025-12-03 | — | — | EP | claimed |
| US-11513071-B2 | Sensing device for detecting analyte containing non-metallic element, and method thereof | 2WITECH SOLUTIONS LLC (US) | 2022-11-29 | — | — | US | claimed |
| US-20210109095-A1 | PROCESS OF PREPARING 3D ARRAY OF PARTICLES AND EXEMPLARY APPLICATION THEREOF IN SENSOR FABRICATION | 2WITECH SOLUTIONS LLC (US) | 2021-04-15 | — | — | US | claimed |
| US-20210109018-A1 | SENSING DEVICE FOR DETECTING ANALYTE CONTAINING NON-METALLIC ELEMENT, AND METHOD THEREOF | 2WITECH SOLUTIONS LLC (US) | 2021-04-15 | — | — | US | claimed |
| US-5213938-A | Oxidation of toner compositions | XEROX CORPORATION (US) | 1993-05-25 | — | — | US | claimed |
| JP-63180906-A | — | — | None | — | — | JP | disclosed |
| EP-4707920-A1 | NANOIMPRINT RESIST | Epinovatech AB (SE) | 2026-03-11 | — | — | EP | disclosed |
| EP-4656669-A1 | FLUORINATED COPOLYMERS BASED ON AN OLIGO(2-OXAZOLINE) MACROMONOMER | ARKEMA FRANCE (FR) | 2025-12-03 | — | — | EP | disclosed |
| EP-4353759-A1 | PRODUCTION METHOD FOR AQUEOUS FLUORINE-CONTAINING ELASTOMER DISPERSION, COMPOSITION, AND AQUEOUS DISPERSION | Daikin Industries, Ltd. (JP) | 2024-04-17 | — | — | EP | disclosed |
| EP-4194474-A1 | METHOD FOR PRODUCING AQUEOUS DISPERSION OF FLUORINE-CONTAINING ELASTOMER | Daikin Industries, Ltd. (JP) | 2023-06-14 | — | — | EP | disclosed |
| EP-4190828-A1 | METHOD FOR MANUFACTURING FLUORINE-CONTAINING ELASTOMER AQUEOUS DISPERSION, FLUORINE-CONTAINING ELASTOMER, AND AQUEOUS DISPERSION | Daikin Industries, Ltd. (JP) | 2023-06-07 | — | — | EP | disclosed |
| US-20230167213-A1 | METHOD FOR MANUFACTURING FLUORINE-CONTAINING ELASTOMER AQUEOUS DISPERSION, FLUORINE-CONTAINING ELASTOMER, AND AQUEOUS DISPERSION | DAIKIN INDUSTRIES, LTD. (JP) | 2023-06-01 | — | — | US | disclosed |
| US-8507189-B2 | Upper layer film forming composition and method of forming photoresist pattern | JSR CORPORATION (JP) | 2013-08-13 | — | — | US | disclosed |
| US-8431332-B2 | Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern | JSR CORPORATION (JP) | 2013-04-30 | — | — | US | disclosed |
| US-20100255416-A1 | COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UPPER LAYER FILM FOR IMMERSION EXPOSURE, AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
| US-20100040974-A1 | UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |
| US-5928832-A | Toner adsorption processes | XEROX CORPORATION (US) | 1999-07-27 | — | — | US | disclosed |
| US-5213938-A | Oxidation of toner compositions | XEROX CORPORATION (US) | 1993-05-25 | — | — | US | disclosed |
| US-5100762-A | Radiation-sensitive polymer and radiation-sensitive composition containing the same | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1992-03-31 | — | — | US | disclosed |
| JP-S63180906-A | OPTICAL MATERIAL | MITSUBISHI RAYON CO LTD | 1988-07-26 | — | — | JP | disclosed |