⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8366584 | 0.85 | — | — | |
| SCHEMBL12325604 | 0.83 | TSHR (0.32) | — | |
| SCHEMBL11039052 | 0.83 | TSHR (0.32) | — | |
| SCHEMBL11038466 | 0.83 | TSHR (0.32) | — | |
| SCHEMBL7247989 | 0.81 | TSHR (0.31) | — | |
| SCHEMBL11037852 | 0.79 | SPHK1 (0.31) | — | |
| SCHEMBL11041755 | 0.78 | TSHR (0.37) | — | |
| SCHEMBL27487614 | 0.77 | — | — | |
| SCHEMBL14003194 | 0.76 | TSHR (0.40) | — | |
| SCHEMBL2454366 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3539942-B1 | METHOD FOR PRODUCING MENTHONES FROM ISOPULEGOL IN THE GAS PHASE | BASF SE (DE) | 2023-09-13 | — | — | EP | disclosed |
| EP-3539942-A1 | METHOD FOR PRODUCING MENTHONES FROM ISOPULEGOL IN THE GAS PHASE | BASF SE (DE) | 2019-09-18 | — | — | EP | disclosed |
| EP-3114104-B1 | METHOD FOR THE PREPARATION OF MENTHONES FROM ISOPULEGOL IN THE GAS PHASE | BASF SE (DE) | 2019-07-17 | — | — | EP | disclosed |
| US-9856199-B2 | Method for producing menthones from isopulegol in the gas phase | BASF SE (DE) | 2018-01-02 | — | — | US | disclosed |
| US-20170066705-A1 | METHOD FOR PRODUCING MENTHONES FROM ISOPULEGOL IN THE GAS PHASE | BASF SE (DE) | 2017-03-09 | — | — | US | disclosed |
| EP-3114104-A1 | METHOD FOR PRODUCING MENTHONES FROM ISOPULEGOL IN THE GAS PHASE | BASF SE (DE) | 2017-01-11 | — | — | EP | disclosed |
| WO-2015132370-A1 | METHOD FOR PRODUCING MENTHONES FROM ISOPULEGOL IN THE GAS PHASE | BASF SE (DE) | 2015-09-11 | — | — | WO | disclosed |
| US-8343711-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-01 | — | — | US | disclosed |
| EP-1735307-B1 | INHIBITORS OF IAP | NOVARTIS AG (CH) | 2012-08-29 | — | — | EP | disclosed |
| US-20100273110-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-10-28 | — | — | US | disclosed |
| US-20060088786-A1 | Rewritable optical information recording medium, recording and reproducing methods, as well as recording and reproducing apparatus | MITSUI CHEMICALS, INC. (JP) | 2006-04-27 | — | — | US | disclosed |
| US-20050208425-A1 | Imide compound and optical recording media made by using the same | YAMAMOTO CHEMICALS, INC. (JP) | 2005-09-22 | — | — | US | disclosed |
| EP-1180765-B1 | Optical recording medium and porphycene compound | MITSUI CHEMICALS INC (JP) | 2005-04-06 | — | — | EP | disclosed |
| EP-1484191-A1 | REWRITABLE OPTICAL INFORMATION RECORDING MEDIUM AND RECORDING/REPRODUCING METHOD, RECORDING/REPRODUCING DEVICE | Sony Corporation (JP) | 2004-12-08 | — | — | EP | disclosed |
| EP-1445115-A1 | IMIDE COMPOUNDS AND OPTICAL RECORDING MEDIA MADE BY USING THE SAME | Mitsui Chemicals, Inc. (JP) | 2004-08-11 | — | — | EP | disclosed |
| US-6627288-B1 | Optical recording medium and porphycene compound | MITSUI CHEMICALS, INC. (JP) | 2003-09-30 | — | — | US | disclosed |
| US-20030091931-A1 | Benzbisazole compound and optical recording medium containing the compound | MITSUI CHEMICALS, INC. (JP) | 2003-05-15 | — | — | US | disclosed |
| EP-1245571-A1 | BENZBISAZOLE COMPOUND AND OPTICAL RECORDING MEDIUM CONTAINING THE COMPOUND | Mitsui Chemicals, Inc. (JP) | 2002-10-02 | — | — | EP | disclosed |
| EP-1180765-A1 | Optical recording medium and porphycene compound | Mitsui Chemicals, Inc. (JP) | 2002-02-20 | — | — | EP | disclosed |
| US-6106999-A | SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS | MITSUI CHEMICALS (JP) | 2000-08-22 | — | — | US | disclosed |