SCHEMBL7247989

SCHEMBL7247989

CCC(C)(CCO)C(C)O

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.31
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12325604 0.82 TSHR (0.32) TSHR
SCHEMBL11039052 0.82 TSHR (0.32) TSHR
SCHEMBL560824 0.82 TDP1 (0.32) TDP1
SCHEMBL3108460 0.81
SCHEMBL8366584 0.79
SCHEMBL16074807 0.78 TSHR (0.35) TSHR
SCHEMBL11037852 0.78 SPHK1 (0.31)
SCHEMBL12393245 0.73 MAPK1 (0.32)
SCHEMBL11041755 0.73 TSHR (0.37) TSHRTDP1
SCHEMBL10883474 0.72 TDP1 (0.32) TSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1219953-A Fabric softening compound/composition PROCTER & GAMBLE (US) 1999-06-16 CN claimed
CN-1195369-A Concentrated and stable fabric softening compositions PROCTER & GAMBLE (US) 1998-10-07 CN claimed
US-9188866-B2 Composition for forming titanium-containing resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-17 US disclosed
US-9176382-B2 Composition for forming titanium-containing resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-03 US disclosed
US-9176382-B2 Composition for forming titanium-containing resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-03 US disclosed
US-20140273447-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed
US-20140273448-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed
US-20140273448-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed
US-20140273447-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed
US-6630441-B2 Neutralized water insoluble amine fabric softener active containing at least two C6-C22 hydrocarbyl groups, no more than one being less than C12 and then the other at least C16; material that increases cationic charge density THE PROCTER & GAMBLE COMPANY 2003-10-07 US disclosed
CN-1195369-A Concentrated and stable fabric softening compositions PROCTER & GAMBLE (US) 1998-10-07 CN disclosed