⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL154308 | 0.75 | — | — | |
| SCHEMBL968846 | 0.75 | — | — | |
| Iodide SCHEMBL1686563 | 0.75 | — | — | |
| SCHEMBL137109 | 0.58 | — | — | |
| Hydrochloric Acid SCHEMBL726210 | 0.50 | — | — | |
| Ethane SCHEMBL21436823 | 0.50 | — | — | |
| SCHEMBL2266230 | 0.50 | — | — | |
| SCHEMBL21820035 | 0.50 | — | — | |
| SCHEMBL5383540 | 0.50 | — | — | |
| SCHEMBL31540340 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 218 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4705411-A2 | PROCESS AND PLANT FOR PRODUCING SYNTHETIC PARAFFINIC KEROSENE AS JET FUEL | Topsoe A/S (DK) | 2026-03-11 | — | — | EP | claimed |
| EP-4705410-A2 | PROCESS AND PLANT FOR PRODUCING SYNTHETIC PARAFFINIC KEROSENE AS JET FUEL | Topsoe A/S (DK) | 2026-03-11 | — | — | EP | claimed |
| EP-4705412-A1 | PROCESS AND PLANT FOR PRODUCING SYNTHETIC PARAFFINIC KEROSENE AS JET FUEL | Topsoe A/S (DK) | 2026-03-11 | — | — | EP | claimed |
| CN-119462778-A | Metallocene compound, preparation method, metallocene catalyst and application thereof | 万华化学集团股份有限公司 | 2025-02-18 | — | — | CN | claimed |
| CN-119406456-A | Catalytic system for ethylene selective oligomerization, preparation method and application | 陕西煤业化工技术研究院有限责任公司 | 2025-02-11 | — | — | CN | claimed |
| WO-2024227725-A1 | PROCESS AND PLANT FOR PRODUCING SYNTHETIC PARAFFINIC KEROSENE AS JET FUEL | TOPSOE A/S (DK) | 2024-11-07 | — | — | WO | claimed |
| WO-2024227724-A2 | PROCESS AND PLANT FOR PRODUCING SYNTHETIC PARAFFINIC KEROSENE AS JET FUEL | TOPSOE A/S (DK) | 2024-11-07 | — | — | WO | claimed |
| WO-2024227723-A2 | PROCESS AND PLANT FOR PRODUCING SYNTHETIC PARAFFINIC KEROSENE AS JET FUEL | TOPSOE A/S (DK) | 2024-11-07 | — | — | WO | claimed |
| CN-115400797-B | Heteroatom-containing metallocene catalyst system and method for catalyzing alpha-olefin oligomerization | 中国科学院山西煤炭化学研究所 | 2024-09-27 | — | — | CN | claimed |
| US-20240239726-A1 | HIGHLY STRUCTURED, HIGH VINYLIDENE PROPYLENE OLIGOMER AND METHOD OF MAKING | CHEVRON USA INC (US) | 2024-07-18 | — | — | US | claimed |
| EP-4097152-A1 | POLYMERIZATION PROCESSES THAT INCLUDE GROUP III AND LANTHANIDE BIS-PHENYL-PHENOXY METAL-LIGAND COMPLEXES AND CHAIN TRANSFER AGENTS | Dow Global Technologies LLC (US) | 2022-12-07 | — | — | EP | claimed |
| CN-115038725-A | Polymerization process comprising group III and lanthanide bis-phenyl-phenoxy metal-ligand complexes and chain transfer agents | 陶氏环球技术有限责任公司 | 2022-09-09 | — | — | CN | claimed |
| WO-2021155168-A1 | POLYMERIZATION PROCESSES THAT INCLUDE GROUP III AND LANTHANIDE BIS-PHENYL-PHENOXY METAL-LIGAND COMPLEXES AND CHAIN TRANSFER AGENTS | DOW GLOBAL TECHNOLOGIES LLC (US) | 2021-08-05 | — | — | WO | claimed |
| WO-2021083194-A1 | CATALYST FOR OLEFIN POLYMERIZATION AND POLYMERIZATION METHOD USING SAME | 中国石油化工股份有限公司 | 2021-05-06 | — | — | WO | claimed |
| US-7429541-B2 | Method of forming trench isolation in the fabrication of integrated circuitry | MICRON TECHNOLOGY, INC. (US) | 2008-09-30 | — | — | US | claimed |
| CN-101255207-A | Carbon nickel series olefin polymerization catalyst containing sulfur family elements as well as preparation and uses thereof | UNIV FUDAN (CN) | 2008-09-03 | — | — | CN | claimed |
| US-7361614-B2 | Method of depositing a silicon dioxide comprising layer in the fabrication of integrated circuitry | MICRON TECHNOLOGY, INC. (US) | 2008-04-22 | — | — | US | claimed |
| US-7157385-B2 | Method of depositing a silicon dioxide-comprising layer in the fabrication of integrated circuitry | MICRON TECHNOLOGY, INC. (US) | 2007-01-02 | — | — | US | claimed |
| US-20060189159-A1 | Methods of depositing a silicon dioxide comprising layer in the fabrication of integrated circuitry, and methods of forming trench isolation in the fabrication of integrated circuitry | DERDERIAN GARO J | 2006-08-24 | — | — | US | claimed |
| US-20050054213-A1 | Methods of depositing a silicon dioxide comprising layer in the fabrication of integrated circuitry, and methods of forming trench isolation in the fabrication of integrated circuitry | OMNIMAX INTERNATIONAL, LLC | 2005-03-10 | — | — | US | claimed |