⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL438244 | 0.67 | — | — | |
| SCHEMBL19170968 | 0.67 | — | — | |
| SCHEMBL329234 | 0.67 | FDPS (0.35) | — | |
| Hydrochloric Acid SCHEMBL29255907 | 0.64 | — | — | |
| Water SCHEMBL28817745 | 0.64 | — | — | |
| SCHEMBL28821646 | 0.64 | — | — | |
| Bromide SCHEMBL11334148 | 0.64 | — | — | |
| SCHEMBL27611426 | 0.64 | — | — | |
| SCHEMBL14524695 | 0.64 | — | — | |
| SCHEMBL5948318 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2251899-B1 | Dielectric barrier deposition using nitrogen containing precursor | VERSUM MAT US LLC (US) | 2018-03-28 | — | — | EP | claimed |
| US-20100291321-A1 | Dielectric Barrier Deposition Using Nitrogen Containing Precursor | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-11-18 | — | — | US | claimed |
| EP-2251899-A1 | Dielectric barrier deposition using nitrogen containing precursor | Air Products and Chemicals, Inc. (US) | 2010-11-17 | — | — | EP | claimed |
| EP-2251899-B1 | Dielectric barrier deposition using nitrogen containing precursor | VERSUM MAT US LLC (US) | 2018-03-28 | — | — | EP | disclosed |
| US-8889235-B2 | Dielectric barrier deposition using nitrogen containing precursor | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2014-11-18 | — | — | US | disclosed |
| US-20100291321-A1 | Dielectric Barrier Deposition Using Nitrogen Containing Precursor | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-11-18 | — | — | US | disclosed |
| EP-2251899-A1 | Dielectric barrier deposition using nitrogen containing precursor | Air Products and Chemicals, Inc. (US) | 2010-11-17 | — | — | EP | disclosed |