SCHEMBL31155700

SCHEMBL31155700

C=C(C)C(=O)OCC(O)COC(C)=O.CC(=O)OCC(O)CC=C(C)C(=O)O

nearest known ligand 0.44

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.44
USP2 O75604 4/20 0.36
ALDH1A1 P00352 3/20 0.36
CYP3A4 P08684 3/20 0.36
MAPT P10636 3/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
HPGD P15428 1/20 0.36
TDP1 Q9NUW8 1/20 0.32
THRB P10828 1/20 0.32
LMNA P02545 1/20 0.31
RECQL P46063 1/20 0.31
MEN1 O00255 1/20 0.31
TP53 P04637 1/20 0.31
MAPK1 P28482 1/20 0.31
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29709470 0.96 TSHR (0.47) TSHRUSP2ALDH1A1CYP3A4MAPT
SCHEMBL6036748 0.94 TSHR (0.49) TSHRUSP2ALDH1A1CYP3A4MAPT
SCHEMBL3164427 0.94 TSHR (0.49) TSHRUSP2ALDH1A1CYP3A4MAPT
SCHEMBL30130369 0.92 TSHR (0.40) TSHRUSP2ALDH1A1CYP3A4MAPT
SCHEMBL4884997 0.88 USP2 (0.40) USP2ALDH1A1CYP3A4MAPTSMN1; SMN2
SCHEMBL30841757 0.88 TSHR (0.41) TSHRALDH1A1HPGD
SCHEMBL30130372 0.87 TSHR (0.40) TSHRALDH1A1
SCHEMBL30151480 0.86 TSHR (0.44) TSHRALDH1A1THRB
SCHEMBL29842311 0.84 TSHR (0.42) TSHRALDH1A1THRB
SCHEMBL3412123 0.83 TSHR (0.61) TSHRUSP2ALDH1A1CYP3A4MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113314402-B Photoresist composition and method for manufacturing semiconductor device 台湾积体电路制造股份有限公司 2025-03-25 CN disclosed
CN-113311661-B Photoresist underlayer composition and method for manufacturing semiconductor device 台湾积体电路制造股份有限公司 2024-10-15 CN disclosed
CN-111863601-B Method for manufacturing semiconductor device and photoresist 台湾积体电路制造股份有限公司 2024-08-27 CN disclosed