SCHEMBL30130372

SCHEMBL30130372

C=C(C)C(=O)OCC(O)COC(=O)CCl.CC(=CCC(O)COC(=O)CCl)C(=O)O

nearest known ligand 0.40

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.40
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29709470 0.91 TSHR (0.47) TSHRALDH1A1
SCHEMBL6036748 0.89 TSHR (0.49) TSHRALDH1A1
SCHEMBL3164427 0.89 TSHR (0.49) TSHRALDH1A1
SCHEMBL31155700 0.87 TSHR (0.44) TSHRALDH1A1
SCHEMBL29842311 0.85 TSHR (0.42) TSHRALDH1A1
SCHEMBL6131210 0.85 TSHR (0.53) TSHRALDH1A1
SCHEMBL30130369 0.85 TSHR (0.40) TSHRALDH1A1
SCHEMBL30841757 0.83 TSHR (0.41) TSHRALDH1A1
SCHEMBL30151480 0.81 TSHR (0.44) TSHRALDH1A1
SCHEMBL30512982 0.75 TSHR (0.50) TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113314402-B Photoresist composition and method for manufacturing semiconductor device 台湾积体电路制造股份有限公司 2025-03-25 CN disclosed
CN-112558416-B Method for manufacturing semiconductor device 台湾积体电路制造股份有限公司 2025-03-18 CN disclosed
CN-113311661-B Photoresist underlayer composition and method for manufacturing semiconductor device 台湾积体电路制造股份有限公司 2024-10-15 CN disclosed
CN-111863601-B Method for manufacturing semiconductor device and photoresist 台湾积体电路制造股份有限公司 2024-08-27 CN disclosed
CN-115494698-A Method for manufacturing semiconductor device and photoresist 台湾积体电路制造股份有限公司 2022-12-20 CN disclosed