Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.50 |
| ▸ | KDM4C | Q9H3R0 | 2/20 | 0.32 |
| ▸ | KDM4A | O75164 | 1/20 | 0.32 |
| ▸ | PHF8 | Q9UPP1 | 1/20 | 0.32 |
| ▸ | KDM2A | Q9Y2K7 | 1/20 | 0.32 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.32 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.32 |
| ▸ | BLM | P54132 | 1/20 | 0.31 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.31 |
| ▸ | EPAS1 | Q99814 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30229875 | 1.00 | LMNA (0.50) | LMNAKDM4CKDM4APHF8KDM2A | |
| SCHEMBL19468509 | 1.00 | LMNA (0.50) | LMNAKDM4CKDM4APHF8KDM2A | |
| SCHEMBL31179857 | 1.00 | LMNA (0.50) | LMNAKDM4CKDM4APHF8KDM2A | |
| SCHEMBL19468452 | 1.00 | LMNA (0.50) | LMNAKDM4CKDM4APHF8KDM2A | |
| SCHEMBL19468484 | 1.00 | LMNA (0.50) | LMNAKDM4CKDM4APHF8KDM2A | |
| SCHEMBL11072048 | 1.00 | LMNA (0.50) | LMNAKDM4CKDM4APHF8KDM2A | |
| SCHEMBL19468494 | 1.00 | LMNA (0.50) | LMNAKDM4CKDM4APHF8KDM2A | |
| SCHEMBL19468511 | 1.00 | LMNA (0.50) | LMNAKDM4CKDM4APHF8KDM2A | |
| SCHEMBL20957510 | 1.00 | LMNA (0.50) | LMNAKDM4CKDM4APHF8KDM2A | |
| SCHEMBL29787938 | 1.00 | LMNA (0.50) | LMNAKDM4CKDM4APHF8KDM2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4684045-A1 | AREA SELECTIVE DEPOSITION OF METAL FILM ON SILICON CONTAINING SURFACES UTILIZING HALIDES | Versum Materials US, LLC (US) | 2026-01-28 | — | — | EP | claimed |
| WO-2024215931-A1 | AREA SELECTIVE DEPOSITION OF METAL FILM ON SILICON CONTAINING SURFACES UTILIZING HALIDES | VERSUM MATERIALS US, LLC (US) | 2024-10-17 | — | — | WO | claimed |
| EP-4684045-A1 | AREA SELECTIVE DEPOSITION OF METAL FILM ON SILICON CONTAINING SURFACES UTILIZING HALIDES | Versum Materials US, LLC (US) | 2026-01-28 | — | — | EP | disclosed |
| WO-2024215931-A1 | AREA SELECTIVE DEPOSITION OF METAL FILM ON SILICON CONTAINING SURFACES UTILIZING HALIDES | VERSUM MATERIALS US, LLC (US) | 2024-10-17 | — | — | WO | disclosed |