⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8196326 | 0.97 | TSHR (0.52) | — | |
| SCHEMBL14790872 | 0.97 | TSHR (0.52) | — | |
| SCHEMBL7942717 | 0.92 | — | — | |
| 1,2-Dichloroethane SCHEMBL11148269 | 0.91 | TSHR (0.57) | — | |
| SCHEMBL28055422 | 0.91 | TSHR (0.57) | — | |
| SCHEMBL10357799 | 0.89 | THRB (0.56) | — | |
| SCHEMBL11788493 | 0.89 | THRB (0.56) | — | |
| SCHEMBL8389274 | 0.89 | THRB (0.56) | — | |
| Butyl Chloride SCHEMBL9486719 | 0.88 | TSHR (0.65) | — | |
| SCHEMBL6947651 | 0.88 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 134 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025090284-A1 | ELECTROLYTE COMPRISING SOLVENT WITH NON-FLUORINE HALOGEN SUBSTITUTE AND BATTERIES COMPRISING SAME | FACTORIAL INC. (US) | 2025-05-01 | — | — | WO | claimed |
| CN-116003656-B | External electron donor composition, ziegler-Natta catalyst composition and propylene polymerization process | 湖北华邦化学有限公司 | 2024-04-26 | — | — | CN | claimed |
| WO-2023236938-A1 | PROCESS FOR SEPARATING AND PURIFYING BY-PRODUCT 2-CHLOROETHYL N-BUTYL ETHER IN PRODUCTION PROCESS OF TRIS(2-BUTOXYETHYL)PHOSPHATE | 浙江万盛股份有限公司 | 2023-12-14 | — | — | WO | claimed |
| CN-114853580-B | Process for separating and purifying 2-butoxychloroethane as byproduct in production process of tri (butoxyethyl) phosphate | 浙江万盛股份有限公司 | 2023-10-31 | — | — | CN | claimed |
| CN-116003656-A | External electron donor composition, ziegler-Natta catalyst composition and propylene polymerization process | 湖北华邦化学有限公司 | 2023-04-25 | — | — | CN | claimed |
| CN-114853580-A | Process for separating and purifying by-product 2-butoxychloroethane in production process of tri (butoxyethyl) phosphate | 浙江万盛股份有限公司 | 2022-08-05 | — | — | CN | claimed |
| EP-4736989-A1 | ACIDIC GAS-ABSORBING LIQUID AND ACIDIC GAS REDUCTION METHOD | AGC INC. (JP) | 2026-05-06 | — | — | EP | disclosed |
| EP-4736988-A1 | ACIDIC GAS-ABSORBING LIQUID AND ACIDIC GAS REDUCTION METHOD | AGC INC. (JP) | 2026-05-06 | — | — | EP | disclosed |
| US-20260115649-A1 | ACIDIC GAS-ABSORBING LIQUID AND ACIDIC GAS REDUCTION METHOD | AGC Inc. (JP) | 2026-04-30 | — | — | US | disclosed |
| US-20260115646-A1 | ACIDIC GAS-ABSORBING LIQUID AND ACIDIC GAS REDUCTION METHOD | AGC Inc. (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4643976-A1 | ACIDIC GAS REMOVAL AGENT, ACIDIC GAS REMOVAL METHOD, ACIDIC GAS ABSORPTION DEVICE, AND CLEANING DEVICE | AGC INC. (JP) | 2025-11-05 | — | — | EP | disclosed |
| US-20250303354-A1 | ACIDIC GAS REMOVAL AGENT, ACIDIC GAS REMOVAL METHOD, ACIDIC GAS ABSORPTION DEVICE, AND CLEANING DEVICE | AGC Inc. (JP) | 2025-10-02 | — | — | US | disclosed |
| WO-2025090284-A1 | ELECTROLYTE COMPRISING SOLVENT WITH NON-FLUORINE HALOGEN SUBSTITUTE AND BATTERIES COMPRISING SAME | FACTORIAL INC. (US) | 2025-05-01 | — | — | WO | disclosed |
| WO-1998056825-A1 | HYDROPHOBICALLY MODIFIED ANIONIC CELLULOSE ETHERS | AKZO NOBEL N.V. (NL) | 1998-12-17 | — | — | WO | disclosed |
| US-5518783-A | TRANSPARENT SUPPORT HAVING OPTIC AXIS INCLINED AT SPECIFIED ANGLE TO NORMAL, OPTICALLY ANISOTROPIC LAYER FORMED FROM DISCOTIC COMPOUND AND COMPATIBLE COMPOUND WHICH LOWERS TRANSITION TEMPERATURE | FUJI PHOTO FILM CO., LTD. (JP) | 1996-05-21 | — | — | US | disclosed |
| US-5514189-A | FOR LUBRICANTS OR FUELS | MOBIL CORPORATION (US) | 1996-05-07 | — | — | US | disclosed |
| EP-0676652-A2 | Optical compensatory sheet and liquid crystal display | FUJI PHOTO FILM CO., LTD. (JP) | 1995-10-11 | — | — | EP | disclosed |
| US-4835312-A | Production process of N-substituted amide compounds | MITSUI CHEMICALS, INCORPORATED (JP) | 1989-05-30 | — | — | US | disclosed |
| US-4108910-A | EPOXIDE COMPOUND AND MONOETHER | SOLVAY & CIE. (BE) | 1978-08-22 | — | — | US | disclosed |
| US-3970728-A | INSECTICIDE, MITICIDE, NEMATOCIDE | BAYER AKTIENGESELLSCHAFT (DT) | 1976-07-20 | — | — | US | disclosed |