SCHEMBL3124073

SCHEMBL3124073

C[Si](C)(Cl)Cl.C[Si](Cl)(Cl)Cl

nearest known ligand 0.62

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.62

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7020815 0.94 ALDH1A1 (0.75) ALDH1A1
SCHEMBL10404218 0.93 ALDH1A1 (0.71) ALDH1A1
SCHEMBL17738 0.93
SCHEMBL17331 0.93
Hydrochloric Acid SCHEMBL3306237 0.86
SCHEMBL756514 0.86
SCHEMBL3953132 0.86 ALDH1A1 (0.62) ALDH1A1
SCHEMBL6560798 0.86
Chloromethane SCHEMBL10466167 0.86
SCHEMBL2484333 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2203384-A1 REMOVAL OF FOREIGN METALS FROM INORGANIC SILANES Evonik Degussa GmbH (DE) 2010-07-07 EP claimed
WO-2009049944-A1 REMOVAL OF FOREIGN METALS FROM INORGANIC SILANES EVONIK DEGUSSA GMBH (DE) 2009-04-23 WO claimed
CN-85100879-A High stability polyhydric silicon emulsion and method for making thereof 1985-12-20 CN claimed
CN-118326365-A Silicon carbide coating and preparation method thereof 苏州铠欣半导体科技有限公司 2024-07-12 CN disclosed
CN-117926590-A High-strength deodorizing weather-resistant fabric and preparation method thereof 上海实钧化工有限公司 2024-04-26 CN disclosed
US-10780027-B2 Composite material having reduced degradation of pasty property SHOFU INC. (JP) 2020-09-22 US disclosed
US-10358389-B2 Silicone composition, substrate coated with the silicone composition and a process therefor DOW SILICONES CORPORATION (US) 2019-07-23 US disclosed
US-20190209439-A1 COMPOSITE MATERIAL HAVING REDUCED DEGRADATION OF PASTY PROPERTY SHOFU INC. (JP) 2019-07-11 US disclosed
US-20170233299-A1 SILICONE COMPOSITION, SUBSTRATE COATED WITH THE SILICONE COMPOSITION AND A PROCESS THEREFOR DOW SILICONES CORPORATION 2017-08-17 US disclosed
CN-106366241-A Ophthalmic material having fluorescence property, and uses thereof 爱博诺德(北京)医疗科技有限公司 2017-02-01 CN disclosed
CN-106362215-A Intraocular lens for preventing and treating after cataract, and preparation method thereof 爱博诺德(北京)医疗科技有限公司 2017-02-01 CN disclosed
US-7368491-B2 Phosphorus-containing silazane composition, phosphorus-containing siliceous film, phosphorus-containing siliceous filler, method for producing phosphorus-containing siliceous film, and semiconductor device AZ ELECTRONIC MATERIALS USA CORP. (US) 2008-05-06 US disclosed
US-20070117892-A1 Coating composition, porous silica-based film, method for producing porous silica-based film and semiconductor device AOKI TOMOKO 2007-05-24 US disclosed
US-5683501-A Compound fine particles and composition for forming film NIPPON SHOKUBAI CO., LTD. (JP) 1997-11-04 US disclosed
US-5389477-A Containing a metal-free phthalocyanine dye in a resin binder MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1995-02-14 US disclosed
US-5175329-A Hydrogenolysis of polysilanes or disilanes DOW CORNING CORPORATION (US) 1992-12-29 US disclosed
CN-85100879-A High stability polyhydric silicon emulsion and method for making thereof 1985-12-20 CN disclosed