SCHEMBL3124358

SCHEMBL3124358

CC(C)(C)C1=CCC(C(C)(C)C)=C1[Nb](C)(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL930575 0.70
SCHEMBL27812319 0.68
SCHEMBL12475483 0.67
SCHEMBL27396756 0.65
SCHEMBL7751993 0.65
Hydrochloric Acid SCHEMBL1072729 0.65
Carbon Monoxide SCHEMBL11396811 0.55 ALDH1A1 (0.30)
SCHEMBL26064871 0.55 POLB (0.34)
SCHEMBL7635325 0.55
SCHEMBL28229880 0.55

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8470401-B2 Use of group V metal containing precursors for a process of depositing a metal containing film L'Air Liquide, Socété Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) 2013-06-25 US claimed
EP-2079751-B1 NEW GROUP V METAL CONTAINING PRECURSORS AND THEIR USE FOR METAL CONTAINING FILM DEPOSITION AIR LIQUIDE (FR) 2010-07-14 EP claimed
US-20100055310-A1 GROUP V METAL CONTAINING PRECURSORS AND THEIR USE FOR METAL CONTAINING FILM DEPOSITION L'AIR LIQUIDE, SOCIETE ANONYME A DIRECTOIRE POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2010-03-04 US claimed
EP-2079751-A1 NEW GROUP V METAL CONTAINING PRECURSORS AND THEIR USE FOR METAL CONTAINING FILM DEPOSITION L'AIR LIQUIDE, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) 2009-07-22 EP claimed
WO-2008049790-A1 NEW GROUP V METAL CONTAINING PRECURSORS AND THEIR USE FOR METAL CONTAINING FILM DEPOSITION L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2008-05-02 WO claimed
EP-1916253-A1 New group V metal containing precursors and their use for metal containing film deposition L'AIR LIQUIDE, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) 2008-04-30 EP claimed
US-8470401-B2 Use of group V metal containing precursors for a process of depositing a metal containing film L'Air Liquide, Socété Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) 2013-06-25 US disclosed
EP-2079751-B1 NEW GROUP V METAL CONTAINING PRECURSORS AND THEIR USE FOR METAL CONTAINING FILM DEPOSITION AIR LIQUIDE (FR) 2010-07-14 EP disclosed
US-20100055310-A1 GROUP V METAL CONTAINING PRECURSORS AND THEIR USE FOR METAL CONTAINING FILM DEPOSITION L'AIR LIQUIDE, SOCIETE ANONYME A DIRECTOIRE POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2010-03-04 US disclosed
EP-2079751-A1 NEW GROUP V METAL CONTAINING PRECURSORS AND THEIR USE FOR METAL CONTAINING FILM DEPOSITION L'AIR LIQUIDE, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) 2009-07-22 EP disclosed
WO-2008049790-A1 NEW GROUP V METAL CONTAINING PRECURSORS AND THEIR USE FOR METAL CONTAINING FILM DEPOSITION L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2008-05-02 WO disclosed
EP-1916253-A1 New group V metal containing precursors and their use for metal containing film deposition L'AIR LIQUIDE, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) 2008-04-30 EP disclosed