Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.40 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31288506 | 1.00 | MEN1 (0.44) | MEN1KMT2ATSHRMAPK1THRB | |
| SCHEMBL31312428 | 1.00 | MEN1 (0.44) | MEN1KMT2ATSHRMAPK1THRB | |
| SCHEMBL31288592 | 1.00 | MEN1 (0.44) | MEN1KMT2ATSHRMAPK1THRB | |
| SCHEMBL31288550 | 1.00 | MEN1 (0.44) | MEN1KMT2ATSHRMAPK1THRB | |
| SCHEMBL30899125 | 1.00 | MEN1 (0.44) | MEN1KMT2ATSHRMAPK1THRB | |
| SCHEMBL31288574 | 1.00 | MEN1 (0.44) | MEN1KMT2ATSHRMAPK1THRB | |
| SCHEMBL31288459 | 1.00 | MEN1 (0.44) | MEN1KMT2ATSHRMAPK1THRB | |
| SCHEMBL31288456 | 1.00 | MEN1 (0.44) | MEN1KMT2ATSHRMAPK1THRB | |
| SCHEMBL7560047 | 1.00 | MEN1 (0.44) | MEN1KMT2ATSHRMAPK1THRB | |
| SCHEMBL31312420 | 1.00 | MEN1 (0.44) | MEN1KMT2ATSHRMAPK1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024258075-A1 | PHOTORESIST CLEANING SOLUTION COMPOSITION AND METHOD FOR FORMING PHOTORESIST PATTERN USING SAME | 에스케이 주식회사 | 2024-12-19 | — | — | WO | disclosed |
| WO-2024258074-A1 | PHOTORESIST CLEANING SOLUTION COMPOSITION, AND METHOD FOR FORMING PHOTORESIST PATTERN BY USING SAME | 에스케이 주식회사 | 2024-12-19 | — | — | WO | disclosed |
| WO-2024258076-A1 | PHOTORESIST CLEANING SOLUTION COMPOSITION AND METHOD FOR FORMING PHOTORESIST PATTERN USING SAME | 에스케이 주식회사 | 2024-12-19 | — | — | WO | disclosed |