SCHEMBL31312428

SCHEMBL31312428

OCCOCCOCCOCCOC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.44

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
TSHR P16473 2/20 0.40
MAPK1 P28482 1/20 0.40
THRB P10828 1/20 0.32
HTT P42858 1/20 0.32
MAPT P10636 1/20 0.32
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31288506 1.00 MEN1 (0.44) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL31288560 1.00 MEN1 (0.44) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL31288592 1.00 MEN1 (0.44) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL31288550 1.00 MEN1 (0.44) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL30899125 1.00 MEN1 (0.44) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL31288574 1.00 MEN1 (0.44) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL31288459 1.00 MEN1 (0.44) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL31288456 1.00 MEN1 (0.44) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL7560047 1.00 MEN1 (0.44) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL31312420 1.00 MEN1 (0.44) MEN1KMT2ATSHRMAPK1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260139174-A1 POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND SUBSTRATE POLISHING METHOD USING THE SAME SK ENPULSE CO., LTD. (KR) 2026-05-21 US disclosed
EP-4722316-A1 POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND SUBSTRATE POLISHING METHOD USING SAME SK enpulse Co., Ltd. (KR) 2026-04-08 EP disclosed
US-20250115786-A1 POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND POLISHING METHOD OF SUBSTRATE USING THE SAME SK ENPULSE CO., LTD. (KR) 2025-04-10 US disclosed
EP-4534622-A1 POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND POLISHING METHOD OF SUBSTRATE USING THE SAME SK enpulse Co., Ltd. (KR) 2025-04-09 EP disclosed
CN-119775902-A Polishing composition for semiconductor process and method for polishing substrate using the same SK恩普士有限公司 2025-04-08 CN disclosed
WO-2025009951-A1 POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND SUBSTRATE POLISHING METHOD USING SAME 에스케이엔펄스 주식회사 2025-01-09 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260139174-A1 POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND SUBSTRATE POLISHING METHOD USING THE SAME PRKD1, PRKCD, PIEZO1 MEN1 3968/4885KMT2A 1678/4885TSHR 3647/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.