SCHEMBL3129778

SCHEMBL3129778

CNC(=O)Nn1nnnc1S

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30632060 1.00
SCHEMBL2418865 0.81
SCHEMBL10533023 0.64
SCHEMBL10832330 0.63 SMN1; SMN2 (0.30)
SCHEMBL9921383 0.62 CYP1A2 (0.35)
SCHEMBL4959685 0.61
SCHEMBL28190084 0.56
SCHEMBL10999456 0.56 MAPK1 (0.34)
SCHEMBL829258 0.55 ALDH1A1 (0.47)
SCHEMBL10042 0.55

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8297939-B2 Method of pumping agglomerative liquid and method of producing recording medium FUJIFILM CORPORATION (JP) 2012-10-30 US disclosed
US-20100021326-A1 Method fo pumping agglomerative liquid and method of producing recording medium FUJIFILM CORPORATION (JP) 2010-01-28 US disclosed
EP-1860498-B1 Photothermographic Material FUJIFILM CORP (JP) 2009-02-18 EP disclosed
EP-1426816-B1 Photothermographic material FUJIFILM CORP (JP) 2009-02-18 EP disclosed
US-7393626-B2 Photothermographic material and method for producing silver halide used for it FUJIFILM CORPORATION (JP) 2008-07-01 US disclosed
EP-1860498-A1 Photothermographic Material FUJIFILM Corporation (JP) 2007-11-28 EP disclosed
EP-1571491-B1 Photothermographic material and method of forming images FUJIFILM CORP (JP) 2007-09-12 EP disclosed
US-20070134603-A9 Photothermographic material YOSHIOKA YASUHIRO 2007-06-14 US disclosed
US-7208264-B2 Photothermographic material and method of forming images FUJIFILM CORPORATION (JP) 2007-04-24 US disclosed
US-20070003882-A9 Photothermographic material, and image forming method using same FUKUI KOUTA 2007-01-04 US disclosed
US-20040126722-A1 Photothermographic material FUJIFILM CORPORATION (JP) 2004-07-01 US disclosed
US-20040115572-A1 Photothermographic material FUJIFILM CORPORATION (JP) 2004-06-17 US disclosed
EP-1426816-A1 Photothermographic material FUJI PHOTO FILM CO., LTD. (JP) 2004-06-09 EP disclosed
US-6727057-B2 One light-sensitive layer containing an organic silver salt, light sensitive silver halide and a reducing agent and at least one light-insensitive layer on a support, wherein the heat- developable photosensitive material comprises a FUJI PHOTO FILM CO., LTD. (JP) 2004-04-27 US disclosed
US-20040053174-A1 Photothermographic material, and image forming method using same FUJIFILM CORPORATION (JP) 2004-03-18 US disclosed
US-20040023175-A1 Photothermographic material and method for producing silver halide used for it FUJIFILM CORPORATION (JP) 2004-02-05 US disclosed
US-20030207217-A1 Heat-developable photosensitive material FUJI PHOTO FILM CO., LTD. 2003-11-06 US disclosed
US-20030198907-A1 Heat-developable photosensitive material FUJI PHOTO FILM CO., LTD. 2003-10-23 US disclosed
US-20030194667-A1 Heat-developable photosensitive material and method of forming images FUJI PHOTO FILM CO., LTD. 2003-10-16 US disclosed
EP-1348997-A1 Heat-developable photosensitive material FUJI PHOTO FILM CO., LTD. (JP) 2003-10-01 EP disclosed