⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5799878 | 0.75 | MEN1 (0.78) | — | |
| SCHEMBL1654 | 0.75 | MEN1 (0.78) | — | |
| Benzene SCHEMBL11697595 | 0.75 | MEN1 (0.78) | — | |
| SCHEMBL1792873 | 0.75 | IDO1 (0.60) | — | |
| Hydrochloric Acid SCHEMBL1862144 | 0.73 | MEN1 (0.74) | — | |
| SCHEMBL21550054 | 0.73 | MEN1 (0.74) | — | |
| Water SCHEMBL11666905 | 0.73 | MEN1 (0.74) | — | |
| Ammonia Solution, Strong SCHEMBL2064651 | 0.73 | MEN1 (0.74) | — | |
| SCHEMBL570594 | 0.73 | — | — | |
| Hydrochloric Acid SCHEMBL7340226 | 0.73 | MAPT (0.62) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 299 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12528738-B2 | Glass fiber sizing agent for daylighting panel and preparation method and use thereof | JUSHI GROUP CO., LTD. (CN) | 2026-01-20 | — | — | US | claimed |
| US-20250270698-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | VERSUM MATERIALS US, LLC | 2025-08-28 | — | — | US | claimed |
| EP-3307816-B1 | HIGH STRENGTH AND MOISTURE RESISTANT ADHESIVE | BISON INT B V (NL) | 2025-02-26 | — | — | EP | claimed |
| CN-119365503-A | Process for preparing and producing amine-containing polybutadiene polymers | 不列颠哥伦比亚大学 | 2025-01-24 | — | — | CN | claimed |
| EP-4493734-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | Versum Materials US, LLC (US) | 2025-01-22 | — | — | EP | claimed |
| CN-119213168-A | Boron-containing precursors for ALD deposition of boron nitride films | 弗萨姆材料美国有限责任公司 | 2024-12-27 | — | — | CN | claimed |
| EP-3347504-B1 | METHODS FOR DEPOSITING A CONFORMAL METAL OR METALLOID SILICON NITRIDE FILM AND RESULTANT FILMS | VERSUM MAT US LLC (US) | 2024-09-25 | — | — | EP | claimed |
| EP-4375256-A1 | GLASS FIBER SIZING AGENT FOR DAYLIGHTING PANEL, AND PREPARATION METHOD THEREFOR AND USE THEREOF | Jushi Group Co., Ltd. (CN) | 2024-05-29 | — | — | EP | claimed |
| US-20240158915-A1 | COMPOSITION FOR ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC | 2024-05-16 | — | — | US | claimed |
| CN-117904602-A | Method for depositing conformal metal or metalloid silicon nitride films | 弗萨姆材料美国有限责任公司 | 2024-04-19 | — | — | CN | claimed |
| EP-2392691-B1 | Organoaminosilane precursors and methods for depositing films comprising the same | AIR PROD & CHEM (US) | 2014-09-03 | — | — | EP | claimed |
| US-20130323435-A1 | ORGANOAMINODISILANE PRECURSORS AND METHODS FOR DEPOSITING FILMS COMPRISING SAME | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-12-05 | — | — | US | claimed |
| CN-103224510-A | Alkoxyaminosilane compounds and applications thereof | AIR PROD & CHEM | 2013-07-31 | — | — | CN | claimed |
| US-20120128897-A1 | Organoaminosilane Precursors and Methods for Depositing Films Comprising Same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-05-24 | — | — | US | claimed |
| EP-2392691-A1 | Organoaminosilane precursors and methods for depositing films comprising the same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-12-07 | — | — | EP | claimed |
| US-20100009546-A1 | Aminosilanes for Shallow Trench Isolation Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-01-14 | — | — | US | claimed |
| EP-2144279-A2 | Aminosilanes for shallow trench isolation films | Air Products and Chemicals, Inc. (US) | 2010-01-13 | — | — | EP | claimed |
| CN-101624698-A | Aminosilane used for shallow trench isolation thin film | AIR PROD & CHEM | 2010-01-13 | — | — | CN | claimed |
| US-7335586-B2 | Sealing porous dielectric material using plasma-induced surface polymerization | INTEL CORPORATION (US) | 2008-02-26 | — | — | US | claimed |
| US-20060281329-A1 | Sealing porous dielectric material using plasma-induced surface polymerization | INTEL CORPORATION | 2006-12-14 | — | — | US | claimed |