Phenol

Phenol

SCHEMBL313013

C=CCOC(=O)C=C.Oc1ccccc1

nearest known ligand 0.53

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.53
THRB P10828 1/20 0.51
ALDH1A1 P00352 4/20 0.46
TSHR P16473 4/20 0.46
HSD17B10 Q99714 2/20 0.46
PKM P14618 1/20 0.45
SMN1; SMN2 Q16637 1/20 0.45
APP P05067 1/20 0.45
NPSR1 Q6W5P4 1/20 0.43
KDM4E B2RXH2 2/20 0.41
TP53 P04637 2/20 0.41
HPGD P15428 1/20 0.41
CA12 O43570 2/20 0.41
CA4 P22748 2/20 0.41
CA9 Q16790 2/20 0.41
CA14 Q9ULX7 2/20 0.41
LIG1 P18858 1/20 0.41
AKR1B10 O60218 1/20 0.41
AKR1B1 P15121 1/20 0.41
CA6 P23280 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phenol SCHEMBL29083052 1.00 CYP3A4 (0.53) CYP3A4THRBALDH1A1TSHRHSD17B10
SCHEMBL28117903 0.86 HCAR2 (0.56) CYP3A4THRBALDH1A1TSHRHSD17B10
Phenol SCHEMBL8483558 0.85 CYP3A4 (0.56) CYP3A4ALDH1A1TSHRHSD17B10PKM
Toluene SCHEMBL1852909 0.84 CYP3A4 (0.51) CYP3A4THRBALDH1A1TSHRHSD17B10
Styrene SCHEMBL167641 0.84 CYP3A4 (0.51) CYP3A4THRBALDH1A1TSHRHSD17B10
Phenol SCHEMBL15955922 0.84 THRB (0.53) CYP3A4THRBALDH1A1TSHRHSD17B10
Benzene SCHEMBL3680373 0.83 CYP3A4 (0.47) CYP3A4THRBALDH1A1TSHRHSD17B10
Acrylic Acid Ethyl Ester SCHEMBL28024840 0.82 CA12 (0.51) THRBALDH1A1TSHRHPGDCA12
SCHEMBL3680375 0.82 CYP3A4 (0.53) CYP3A4THRBALDH1A1TSHRHSD17B10
Styrene SCHEMBL3117319 0.81 CYP3A4 (0.49) CYP3A4THRBALDH1A1TSHRHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 136 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220040914-A1 FUNCTIONALIZED PRODUCT FABRICATED FROM A RESIN COMPRISING A FUNCTIONAL COMPONENT AND A POLYMERIC RESIN, AND METHOD OF MAKING THE SAME NATIONAL RESEARCH COUNCIL OF CANADA (CA) 2022-02-10 US claimed
US-20210139689-A1 METHODS FOR FORMING HIGH SHRINK WRAP LABEL SLEEVES POLYSACK FLEXIBLE PACKAGING LTD. (IL) 2021-05-13 US claimed
US-20210087432-A1 SHRINK WRAP LABELS FOR SHAPED ARTICLES POLYSACK FLEXIBLE PACKAGING LTD. 2021-03-25 US claimed
US-10899920-B2 Methods for forming high shrink wrap label sleeves POLYSACK FLEXIBLE PACKAGING LTD. (IL) 2021-01-26 US claimed
WO-2020079669-A1 FUNCTIONALIZED PRODUCT FABRICATED FROM A RESIN COMPRISING A FUNCTIONAL COMPONENT AND A POLYMERIC RESIN, AND METHOD OF MAKING THE SAME NATIONAL RESEARCH COUNCIL OF CANADA (CA) 2020-04-23 WO claimed
WO-2020053651-A1 SHRINK WRAP LABELS FOR SHAPED ARTICLES POLYSACK FLEXIBLE PACKAGING LTD. (IL) 2020-03-19 WO claimed
US-20200087551-A1 METHODS FOR USING TWO SEAMING AGENTS ON ONE SYSTEM POLYSACK FLEXIBLE PACKAGING LTD. 2020-03-19 US claimed
US-20200087505-A1 METHODS FOR FORMING HIGH SHRINK WRAP LABEL SLEEVES POLYSACK FLEXIBLE PACKAGING LTD. (IL) 2020-03-19 US claimed
WO-2020053656-A1 METHODS FOR USING TWO SEAMING AGENTS ON ONE SYSTEM POLYSACK FLEXIBLE PACKAGING LTD. (IL) 2020-03-19 WO claimed
WO-2020053649-A2 METHODS FOR FORMING HIGH SHRINK WRAP LABEL SLEEVES POLYSACK FLEXIBLE PACKAGING LTD. (IL) 2020-03-19 WO claimed
US-20140163132-A1 RADIATION CURABLE COATING COMPOSITION FOR OPTICAL FIBER WITH REDUCED ATTENUATION LOSS DSM IP ASSETS B.V (NL) 2014-06-12 US claimed
US-7468227-B2 Method of reducing the average process bias during production of a reticle APPLIED MATERIALS, INC. (US) 2008-12-23 US claimed
US-7208249-B2 Method of producing a patterned photoresist used to prepare high performance photomasks APPLIED MATERIALS, INC. (US) 2007-04-24 US claimed
US-20060105248-A1 Method of reducing the average process bias during production of a reticle APPLIED MATERIALS, INC. 2006-05-18 US claimed
EP-0898589-B1 RADIATION-CURABLE COMPOSITION HAVING HIGH CURE SPEED DSM IP ASSETS BV (NL) 2004-12-15 EP claimed
CN-1173424-C Protective coating for separators for electrochemical cells ̩ 2004-10-27 CN claimed
US-20040063003-A1 Method of producing a patterned photoresist used to prepare high performance photomasks APPLIED MATERIALS, INC. 2004-04-01 US claimed
US-6280911-B1 FORMING A PHOTORESIST RELIEF IMAGE ON MICROELECTRONIC WAFER SUBSTRATES OR FLAT PANEL DISPLAY SUBSTRATE, EXPOSURE TO ACTIVATING RADIATION SHIPLEY COMPANY, L.L.C. 2001-08-28 US claimed
EP-0898589-A1 RADIATION-CURABLE COMPOSITION HAVING HIGH CURE SPEED DSM N.V. (NL) 1999-03-03 EP claimed
WO-1998039374-A1 RADIATION-CURABLE COMPOSITION HAVING HIGH CURE SPEED DSM N.V. (NL) 1998-09-11 WO claimed