⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8381557 | 0.83 | — | — | |
| SCHEMBL1132847 | 0.72 | — | — | |
| SCHEMBL316487 | 0.72 | — | — | |
| SCHEMBL3263048 | 0.72 | — | — | |
| SCHEMBL2992262 | 0.72 | — | — | |
| SCHEMBL8385899 | 0.72 | — | — | |
| SCHEMBL8335354 | 0.72 | — | — | |
| SCHEMBL1025425 | 0.67 | — | — | |
| SCHEMBL8383796 | 0.65 | — | — | |
| SCHEMBL8382612 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2129 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260090068-A1 | SEMICONDUCTOR DEVICE AND METHODS OF FORMATION | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2026-03-26 | — | — | US | claimed |
| US-20250372373-A1 | GATE-ALL-AROUND (GAA) INTERFACE MODIFICATIONS TO IMPROVE ABRUPTNESS | APPLIED MATERIALS INC (US) | 2025-12-04 | — | — | US | claimed |
| US-20250338599-A1 | SEMICONDUCTOR GATE STRUCTURE AND METHODS OF FORMING THE SAME | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2025-10-30 | — | — | US | claimed |
| CN-119823437-A | Preparation method of antistatic high-elasticity TPU | 浙江驭能新材料科技有限公司 | 2025-04-15 | — | — | CN | claimed |
| CN-117925165-A | High-temperature-resistant high-humidity epoxy magnetic circuit adhesive and preparation method thereof | 广东德聚技术股份有限公司 | 2024-04-26 | — | — | CN | claimed |
| CN-116143546-B | High-strength low-impurity foam carbon material and preparation method thereof | 陕西美兰德新材料股份有限公司 | 2024-02-06 | — | — | CN | claimed |
| CN-114797993-B | Surface hydroxyl shielding and surface modifying method for solid catalyst | 太原工业学院 | 2023-10-27 | — | — | CN | claimed |
| CN-114768823-B | Method for preparing oil product by hydrogenating synthesis gas | 太原工业学院 | 2023-10-27 | — | — | CN | claimed |
| EP-3663301-B1 | BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS | VERSUM MAT US LLC (US) | 2023-08-30 | — | — | EP | claimed |
| CN-116581282-A | Alloyed negative electrode material, preparation method and application thereof | 北京壹金新能源科技有限公司 | 2023-08-11 | — | — | CN | claimed |
| CN-101444457-B | Lotion light type eyeshadow cream | HONGLIANG DU | 2010-12-08 | — | — | CN | claimed |
| US-7629267-B2 | High stress nitride film and method for formation thereof | ASM INTERNATIONAL N.V. (NL) | 2009-12-08 | — | — | US | claimed |
| CN-101444457-A | Lotion light type eyeshadow cream | HONGLIANG DU (CN) | 2009-06-03 | — | — | CN | claimed |
| CN-1311097-C | Mechanical enhancer additives for low dielectric films | AIR PROD & CHEM (US) | 2007-04-18 | — | — | CN | claimed |
| US-20060199357-A1 | High stress nitride film and method for formation thereof | ASM INTERNATIONAL N.V. (NL) | 2006-09-07 | — | — | US | claimed |
| EP-1178844-B1 | ABSORBENT ARTICLE HAVING A SKIN CARE COMPOSITION | PROCTER & GAMBLE (US) | 2005-10-26 | — | — | EP | claimed |
| CN-1576390-A | Mechanical enhancer additives for low dielectric films | AIR PROD & CHEM (US) | 2005-02-09 | — | — | CN | claimed |
| US-20040241463-A1 | Mechanical enhancer additives for low dielectric films | VERSUM MATERIALS US, LLC | 2004-12-02 | — | — | US | claimed |
| EP-1482070-A1 | Mechanical enhancer additives for low dielectric films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-12-01 | — | — | EP | claimed |
| US-4206252-A | CONTINUOUS PROCESSING, VAPOR DEPOSITION | GORDON ROY G | 1980-06-03 | — | — | US | claimed |