Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FFAR3 | O14843 | 1/20 | 0.43 |
| ▸ | RNPEP | Q9H4A4 | 1/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.41 |
| ▸ | NAALAD2 | Q9Y3Q0 | 3/20 | 0.41 |
| ▸ | FOLH1 | Q04609 | 2/20 | 0.41 |
| ▸ | ENPEP | Q07075 | 2/20 | 0.41 |
| ▸ | MME | P08473 | 3/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | GABRR1 | P24046 | 2/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4662945 | 0.83 | — | — | |
| SCHEMBL2601836 | 0.83 | — | — | |
| Isobutanol SCHEMBL11138179 | 0.83 | FFAR3 (0.62) | FFAR3RNPEPCYP1A2TSHR | |
| SCHEMBL275848 | 0.83 | — | — | |
| Phosphine SCHEMBL27416822 | 0.81 | RNPEP (0.52) | RNPEPCYP1A2SLC7A5NAALAD2FOLH1 | |
| Propionic Acid SCHEMBL17646231 | 0.81 | FFAR3 (0.42) | FFAR3CYP1A2NAALAD2FOLH1ENPEP | |
| Propionic Acid SCHEMBL27738326 | 0.81 | FFAR3 (0.42) | FFAR3CYP1A2NAALAD2FOLH1ENPEP | |
| SCHEMBL21559845 | 0.75 | SLC1A3 (0.39) | RNPEPCYP1A2SLC7A5NAALAD2FOLH1 | |
| SCHEMBL20457288 | 0.75 | RNPEP (0.46) | RNPEPCYP1A2SLC7A5NAALAD2FOLH1 | |
| SCHEMBL7314519 | 0.72 | NAALAD2 (0.56) | RNPEPCYP1A2SLC7A5NAALAD2FOLH1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119535888-A | Photoresist solution and preparation method of patterned photoresist layer | 台湾积体电路制造股份有限公司 | 2025-02-28 | — | — | CN | disclosed |