SCHEMBL31343129

SCHEMBL31343129

C=C[Si](C)(C)OC(C)C(C)O[Si](C)(C)C=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL556803 0.82
SCHEMBL27772225 0.80
SCHEMBL5823076 0.74
SCHEMBL17874989 0.74
SCHEMBL4265425 0.74
SCHEMBL8832367 0.72 MAPK1 (0.40)
SCHEMBL8759231 0.71
SCHEMBL9410867 0.69
SCHEMBL9410863 0.69
SCHEMBL20668754 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025023483-A1 PRECURSOR FOR FORMING LOW-K THIN FILM AND METHOD FOR FORMING LOW-K SILICON-CONTAINING THIN FILM USING SAME 에스케이트리켐 주식회사 2025-01-30 WO disclosed