SCHEMBL5823076

SCHEMBL5823076

C=C[Si](C)(C)OC([SiH3])O[Si](C)(C)C=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31343129 0.74
SCHEMBL556803 0.74
SCHEMBL27772225 0.72
SCHEMBL307665 0.67
SCHEMBL17874989 0.67
SCHEMBL9410867 0.67
SCHEMBL4265425 0.67
SCHEMBL9410863 0.67
SCHEMBL20668754 0.67
SCHEMBL5925201 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20060228549-A1 Polymer coated metal oxide and process for producing the same TOKYO INSTITUTE OF TECHNOLOGY (JP) 2006-10-12 US claimed
US-20060228549-A1 Polymer coated metal oxide and process for producing the same TOKYO INSTITUTE OF TECHNOLOGY (JP) 2006-10-12 US disclosed
JP-2006056923-A INK FOR INK-JET RECORDING TOKYO INSTITUTE OF TECHNOLOGY 2006-03-02 JP disclosed
JP-2005307196-A SILOXANE DERIVATIVE AND PRODUCTION METHOD THEREOF RIKOGAKU SHINKOKAI 2005-11-04 JP disclosed